Film-forming method for forming metal oxide on substrate surface

1 . A film-forming method comprising:

introducing oxygen radicals and an organic raw material gas containing a metal element into a vacuum container; and

reacting the organic raw material gas with the oxygen radicals, thereby forming a metal oxide film on a surface of a substrate disposed in the vacuum container.

2 . A film-forming method comprising:

introducing oxygen radicals and an organic raw material gas containing a metal element into a vacuum container such that the organic raw material gas and the oxygen radicals are for the first time brought into contact with each other in the vacuum container; and

reacting the organic raw material gas with the oxygen radicals, thereby forming a metal oxide film on a surface of a substrate disposed in the vacuum container.

3 . The film-forming method according to claim 1 , wherein

the oxygen radicals and the organic raw material gas containing a metal element are introduced into a film-forming treatment space by way of a plurality of injection holes, and the organic raw material gas is reacted with the oxygen radicals in the film-forming treatment space, thereby a metal oxide film is formed on the surface of the substrate;

said film-forming treatment space is defined in the vacuum container by a space between a substrate disposed in the vacuum container and a plurality of injection holes disposed to face said substrate.

4 . The film-forming method according to claim 2 , wherein

the oxygen radicals and the organic raw material gas containing a metal element are introduced into a film-forming treatment space by way of a plurality of injection holes, and the organic raw material gas is reacted with the oxygen radicals in the film-forming treatment space, thereby a metal oxide film is formed on the surface of the substrate;

said film-forming treatment space is defined in the vacuum container by a space between a substrate disposed in the vacuum container and a plurality of injection holes disposed to face said substrate.

5 . A film-forming method according to claim 1 , wherein the metal element contained in the organic raw material gas is selected from the group consisting of ruthenium, hafnium, titanium, tantalum, zirconium and aluminum.

6 . A film-forming method according to claim 2 , wherein the metal element contained in the organic raw material gas is selected from the group consisting of ruthenium, hafnium, titanium, tantalum, zirconium and aluminum.

7 . A film-forming method according to claim 3 , wherein the metal element contained in the organic raw material gas is selected from the group consisting of ruthenium, hafnium, titanium, tantalum, zirconium and aluminum.

8 . A film-forming method according to claim 4 , wherein the metal element contained in the organic raw material gas is selected from the group consisting of ruthenium, hafnium, titanium, tantalum, zirconium and aluminum.

9 . A film forming method comprising:

generating oxygen radicals in a plasma generating space in a vacuum container;

introducing an organic raw material gas containing a metal element and the oxygen radicals into a film forming treatment space in the vacuum container such that the organic raw material gas containing a metal element and the oxygen radicals are brought into contact with each other for the first time in the film forming treatment space; and

reacting the organic raw material gas containing a metal element with the oxygen radicals to form a metal oxide film on a surface of a substrate disposed in the vacuum container.

10 . A film-forming method according to claim 9 , wherein the metal element contained in the organic raw material gas is selected from the group consisting of ruthenium, hafnium, titanium, tantalum, zirconium and aluminum.