Semiconductor integrated circuit device
View Patent ↗In an integrated circuit device, there are various optimum gate lengths, thickness of gate oxide films, and threshold voltages according to the characteristics of circuits. In a semiconductor integrated circuit device in which the circuits are integrated on the same substrate, the manufacturing process is complicated in order to set the circuits to the optimum values. As a result, in association with deterioration in the yield and increase in the number of manufacturing days, the manufacturing cost increases. In order to solve the problems, according to the invention, transistors of high and low thresholds are used in a logic circuit, a memory cell uses a transistor of the same high threshold voltage and a low threshold voltage transistor, and an input/output circuit uses a transistor having the same high threshold voltage and the same concentration in a channel, and a thicker gate oxide film.
1. A semiconductor integrated circuit device, comprising:
a dynamic memory cell array, each memory cell having a transfer NMOS transistor and a capacitor,
a data input and output circuit having a first NMOS transistor, and
a logic circuit including a second NMOS transistor,
wherein a thickness of a gate insulating film of the transfer NMOS transistor is greater than a thickness of a gate insulating film of the second NMOS transistor,
wherein a channel length of the transfer NMOS transistor is greater than a channel length of the second NMOS transistor,
wherein the thickness of the gate insulating film of the transfer NMOS transistor and the first NMOS transistor is the same, and
wherein the channel length of the transfer NMOS transistor is larger than a channel length of the first NMOS transistor.
2. A semiconductor integrated circuit device according to claim 1 , wherein a voltage supplied to the transfer NMOS transistor and the first NMOS transistor is the same.
3. A semiconductor integrated circuit according to claim 2 , wherein the data input and output circuit has a first PMOS transistor, with the same thickness of gate insulating film as the gate insulating film of the transistor NMOS transistor.
4. A semiconductor integrated circuit according to claim 1 , wherein the data input and output circuit has a first PMOS transistor, with the same thickness of gate insulating film as the gate insulating film of the transfer NMOS transistor.
5. A semiconductor integrated circuit according to claim 1 , wherein the data input and output circuit region surrounds the dynamic memory cell array region.