Patent Assignment
Reel/Frame 024944/0577
Merger and Change of Name
Recorded: 2010-09-02
Received: 2010-09-02
Pages: 42
Assignor
RENESAS TECHNOLOGY CORP.
Executed: 2010-04-01
Assignee
RENESAS ELECTRONICS CORPORATION
1753, SHIMONUMABE, NAKAHARA-KU, KAWASAKI-SHI, KANAGAWA, JPX, 211-8668, JAPAN
Covered Properties
(49)
Fabrication System and Fabrication Method
Application:
12/556,136 →
Semiconductor Memory Device
Application:
12/222,753 →
Semiconductor Integrated Circuit Device
Application:
12/216,716 →
Fabrication System and Fabrication Method
Application:
12/153,926 →
Method of Forming a Cmos Structure Having Gate Insulation Films of Different Thicknesses
Application:
12/153,385 →
Transmitter Circuits and Apparatus of Wireless Application
Application:
11/755,273 →
Semiconductor Memory Device
Application:
11/717,629 →
Wireless communication receiver
Application:
11/702,493 →
Semiconductor storage device and manufacturing method thereof
Application:
11/435,934 →
Semiconductor Integrated Circuit Device and Contactless Ic Card
Application:
11/432,378 →
Logical Level Converter and Phase Locked Loop Using the Same
Application:
11/403,968 →
Fabrication System and Fabrication Method
Application:
11/320,610 →
Fabrication System and Fabrication Method
Application:
11/320,778 →
Variable Inductor, and Oscillator and Communication System Using the Same
Application:
11/268,643 →
Sram Memory Semiconductor Integrated Circuit Device
Application:
11/188,735 →
Method of Forming a Cmos Structure Having Gate Insulation Films of Different Thicknesses
Application:
11/118,951 →
Semiconductor Integrated Circuit Device and Contactless Ic Card
Application:
11/028,043 →
Semiconductor Integrated Circuit Device and Microcomputer
Application:
10/982,945 →
Semiconductor Non-Volatile Memory Cell with a Plurality of Charge Storage Regions
Application:
10/919,471 →
Polishing Method, Metallization Fabrication Method, Method for Manufacturing Semiconductor Device and Semiconductor Device
Application:
10/898,252 →
Semiconductor Device Having Low-K Insulating Film
Application:
10/896,885 →
Semiconductor Integrated Circuit Device, Storage Medium on Which Cell Library Is Stored and Designing Method for Semiconductor Intergrated Circuit
Application:
10/827,291 →
Mis Semiconductor Device and Manufacturing Method Thereof
Application:
10/825,163 →
Semiconductor Memory Device
Application:
10/733,270 →
Semiconductor Integrated Circuit Device
Application:
10/731,152 →
Fabrication System and Fabrication Method
Application:
10/713,012 →
Electron Device Manufacturing Method, a Pattern Forming Method, and a Photomask Used for Those Methods
Application:
10/671,666 →
Hardware Accelerator for a Platform-Independent Code
Application:
10/457,409 →
Semiconductor Integrated Circuit Device and Microcomputer
Application:
10/446,797 →
Semiconductor Manufacturing Method for Low-K Insulating Film
Application:
10/414,010 →
Parallel Processing Processor and Parallel Processing Method
Application:
10/413,143 →
Mis Semiconductor Device and Manufacturing Method Thereof
Application:
10/372,329 →
Method for Manufacturing Semiconductor Device
Application:
10/297,811 →
Semiconductor Integrated Circuit Device
Application:
10/300,747 →
Wireless Communication Receiver
Application:
10/253,648 →
A Semiconductor Integrated Circuit a Base Band Filter Including
Application:
10/232,722 →
Radio Frequency Modules and Modules for Moving Target Detection
Application:
10/231,000 →
Semiconductor Device and Power Amplifier Using the Same
Application:
10/120,505 →
Probing Device and Manufacturing Method Thereof, as Well as Testing Apparatus and Manufacturing Method of Semiconductor with Use Thereof
Application:
10/119,077 →
Semiconductor Integrated Circuit Device
Application:
10/109,669 →
Semiconductor Integrated Circuit Device, Storage Medium on Which Cell Library Is Stored and Designing Method for Semiconductor Integrated Circuit
Application:
10/084,435 →
Composite Ic Card
Application:
10/018,802 →
Processor Having Priority Changing Function According to Threads
Application:
10/022,533 →
Manufacturing Method of Semiconductor Device
Application:
09/996,894 →
Semiconductor Integrated Circuit Device
Application:
09/987,820 →
Semiconductor Non-Volatile Memory
Application:
09/944,073 →
Field Effect Transistor and Method of Fabricating the Same by Controlling Distribution Condition of Impurity Region with Implantation of Additional Ion
Application:
09/907,714 →
Method of Forming a Cmos Structure Having Gate Insulation Films of Different Thicknesses
Application:
09/852,793 →
Electron Device Manufacturing Method, a Pattern Forming Method, and a Photomask Used for Those Methods
Application:
09/810,194 →