IP Library › Granted Patent US 6,750,000
Granted Patent Utility
US 6,750,000 · Confirmation No. 8279

ELECTRON DEVICE MANUFACTURING METHOD, A PATTERN FORMING METHOD, AND A PHOTOMASK USED FOR THOSE METHODS

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2004-05-03 IFEE Issue Fee Payment (PTO-85B) 1 View
2004-02-03 NOA Notice of Allowance and Fees Due (PTOL-85) 3 View
2004-02-03 NOA Notice of Allowance and Fees Due (PTOL-85) 4 View
2004-02-03 1449 List of References cited by applicant and considered by examiner 1 View
2004-02-03 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2004-02-03 FWCLM Index of Claims 1 View
2004-02-03 SRFW Search information including classification, databases and other search related notes 1 View
2004-02-03 DRW Drawings-only black and white line drawings 1 View
2004-01-23 SRNT Examiner's search strategy and results 1 View
2003-09-29 TRNA Transmittal of New Application 5 View
2003-09-29 SPEC Specification 82 View
2003-09-29 CLM Claims 4 View
2003-09-29 ABST Abstract 1 View
2003-09-29 DRW Drawings-only black and white line drawings 27 View
2003-09-29 OATH Oath or Declaration filed 4 View
2003-09-29 A.PE Preliminary Amendment 1 View
2003-09-29 SPEC Specification 1 View
2003-09-29 CLM Claims 4 View
2003-09-29 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2003-09-29 IDS Information Disclosure Statement (IDS) Form (SB08) 2 View
2003-09-29 WFEE Fee Worksheet (SB06) 1 View
2003-09-29 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
Patent No.
US 6,750,000
App. No.
10/671,666
Filed
2003-09-29
Granted
2004-06-15
Pub. No.
US20040043307A1
Examiner
SAGAR, KRIPA
Art Unit
1756
PTA
0 days