Apparatus for forming nano pattern and method for forming the nano pattern using the same

1. An apparatus for forming a nano pattern comprising:

a laser to generate a beam;

a beam splitter to split the beam from the laser into two beams having the same intensity;

variable mirrors to reflect the two beams split by the beam splitter to a substrate;

beam expansion units to expand the diameters of the two beams, respectively positioned on paths of the two beams traveling toward the substrate;

a beam blocking unit, installed on an upper part of the substrate, to transmit only a specific region of the expanded beam through the beam expansion unit and to block a remaining region to form a uniform pattern; and

a substrate transfer device to transfer the substrate vertically and horizontally, to allow the entire surface of the substrate to be irradiated, installed on a lower part of the substrate,

wherein the beam blocking unit only transmits a central part of the expanded beams, the central part of the beams having maximum intensity,

wherein the substrate transfer device transfers substrate sequentially by an equal amount to each section of the uniform pattern, and

the central parts of the beams are limited to being greater than half of the maximum intensity thereof.

2. The apparatus for forming the nano pattern according to claim 1 , further comprising reflection mirrors to change a path of the beam generated by the laser disposed between the laser and the beam splitter.

3. A method for forming a nano pattern comprising:

generating a beam through a laser;

splitting the beam into two beams having the same intensity through a beam splitter;

directing the two beams to a substrate through variable mirrors;

expanding diameters of the beams through beam expansion units respectively positioned on paths of the two beams traveling toward the substrate;

illuminating the substrate by transmitting only a central part of the expanded beams through a beam blocking unit installed on an upper part of the substrate;

irradiating the beams over the entire surface of the substrate to form a uniform pattern by a movement of a substrate transfer device having the substrate mounted thereon and installed on a lower part of the substrate, the substrate transfer device being moved vertically and horizontally by amounts equal to each section of the uniform pattern, the central part of the beams having a maximum intensity; and

irradiating the beams sequentially forming the uniform patterns on the substrate by transferring the substrate as much as each uniform pattern,

wherein the central parts of the beams are limited to being greater than half of the maximum intensity thereof.

4. The method according to claim 3 , further comprising coating the substrate with UV curable resin.

5. The method according to claim 3 , further comprising:

changing a path of the beam generated from the laser through at least one reflection mirror.