IP Library Granted Patent US 7,960,693
Granted Patent B2
US 7,960,693 · App. 12/220,321 · Granted Jun 14, 2011

Microengineered electrode assembly

Assignee: Microsaic Systems Limited
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Quick Facts
Patent No.
US 7,960,693
App. No.
12/220,321
Granted
Jun 14, 2011
Kind
B2
Abstract

Microengineered stacked ring electrode assemblies capable of acting as either RF or DC ion guides in an ion optical system, and method of fabricating same are described. The electrodes are fabricated using planar processing as sets of grooved, proud features formed in a layer of material lying on an insulating substrate. Two such structures are then stacked together to form a set of diaphragm electrodes with closed pupils. Arrangements for fabrication by patterning, etching and bonding are described, together with methods for tapering the electrode pupils or otherwise varying the ion path.

Claims (48)

1. A microengineered stacked ring RF-only ion guide defining an ion path, the guide comprising first and second substrates, each of the first and second substrates having at least first and second features defined thereon, the features being configured such that when the first and second substrates are brought together the features on opposing substrates combine to form complete diaphragm electrodes containing closed pupils; each of the closed pupils in adjacent diaphragm electrodes cooperating to form an ion path through the ion guide with a central axis of the pupils defining the ion path, and wherein neighboring electrodes are coupled to a voltage supply of an opposing polarity to that of their neighbor so as to operably drive the ions towards the central axis.

2. The ion guide of claim 1 wherein each of the features is upstanding from and proud of the substrate.

3. The ion guide of claim 1 wherein at least some of the features have grooves formed in an upper surface thereof.

4. The ion guide of claim 3 wherein each of the features has grooves, the grooves being configured to form a closed pupil on the bringing together of opposing substrates.

5. The ion guide of claim 1 wherein the closed pupil formed in a first diaphragm electrode is co-linear with a closed pupil in a second adjacent diaphragm electrode.

6. The ion guide of claim 1 wherein the closed pupil formed in a first diaphragm electrode is offset from a closed pupil in a second adjacent diaphragm electrode.

7. The ion guide of claim 1 , in which alternate electrodes are connected together in two sets by two additional features forming two bus bars.

8. The ion guide of claim 1 being configured to effect a transportation of ions.

9. The ion guide of claim 1 being configured to effect a concentration of ions.

10. The ion guide of claim 1 being configured to effect a fragmentation of ions.

11. The ion guide of claim 1 being configured to be operable with a mass filter.

12. The ion guide of claim 11 wherein the mass filter includes a quadrupole.

13. The ion guide of claim 1 being configured to be operable in a vacuum interface.

14. The ion guide of claim 1 being configured to be operable in a collision cell.

15. The ion guide of claim 1 being configured such that alternate electrodes are connectable to different AC voltages.

16. The ion guide of claim 1 being configured such that alternate electrodes are connectable to different DC voltages.

17. The ion guide of claim 1 being configured such that the electrodes are independently driven.

18. The ion guide of claim 1 wherein the closed pupils are substantially identical.

19. The ion guide of claim 1 in which the width of each of the closed pupils varies from electrode to electrode.

20. The ion guide of claim 1 being operable as an ion funnel.

21. The ion guide of claim 1 being configured to form an ion storage ring.

22. The ion guide of claim 1 wherein the closed pupil widths are defined by lithography.

23. The ion guide of claim 1 wherein the closed pupils are formed by an etching process.

24. The ion guide of claim 1 wherein the closed pupils are formed by powder blasting.

25. The ion guide of claim 1 wherein the features are defined by lithography and etching.

26. The ion guide of claim 1 wherein the features are formed in a metal, semiconductor, a metallised semiconductor.

27. The ion guide of claim 26 , in which the semiconductor is silicon.

28. The ion guide of claim 1 in which the substrates are formed in an insulator.

29. The ion guide of claim 28 , in which the insulator is a glass, a plastic or a ceramic.

30. The ion guide of claim 1 including a unique identifier.

31. A mass analysis device including a mass filter and an ion guide as claimed in claim 1 .

32. The device of claim 31 wherein the mass filter includes a quadrupole.

33. The device of claim 31 wherein the ion guide and mass filter are fabricated on a common substrate.

34. The device of claim 33 wherein the ion guide and mass filter are aligned such that ions emitted from the ion guide may travel into the mass filter.

35. The device of claim 31 wherein the mass filter is fabricated in two halves that are assembled by stacking.

36. The device of claim 35 wherein the stacking of the two halves provides pairs of etched, metallised features that provide mechanical mounts for and electrical connections to a plurality of rods.

37. The device of claim 36 wherein the massfilter is fabricated by stacking each of the halves and subsequently inserting rods onto the mechanical mounts, the rods on insertion straddling an etched, metallised trench formed in a raised feature.

38. A set of RF-only ion guides, each of the set of ion guides comprising first and second substrates, each of the first and second substrates having at least first and second features defined thereon, the features being configured such that when the first and second substrates are brought together the features on opposing substrates combine to form complete diaphragm electrodes containing closed pupils, the set being arranged as a parallel array; each of the closed pupils in adjacent diaphragm electrodes cooperating to form an ion path through the ion guide with a central axis of the pupils defining the ion path, and wherein neighboring electrodes are coupled to a voltage supply of an opposing polarity to that of their neighbor so as to operably drive the ions towards the central axis.

39. A method of forming a stacked ring electrode assembly capable of acting as a RF-only ion guides in an ion optical system, the method including:

processing sets of grooved, proud features in a layer of material lying on an insulating substrate,

bringing together in a stack arrangement two such substrates to form a set of diaphragm electrodes with closed pupils, each of the closed pupils in adjacent diaphragm electrodes cooperating to form an ion path through the ion guide with a central axis of the pupils defining the ion path, and

coupling neighboring electrodes to a voltage supply of an opposing polarity to that of their neighbor so as to operably drive the ions towards the central axis.

40. A microengineered ion guide, fabricated from first and substrates, each of the first and second substrates having compatible structures such that when the first and second substrates are brought together to form a sandwich structure the compatible structures mate with one another to form a set of electrode rings defining closed pupils, each of the closed pupils in adjacent electrode rings cooperating to form an ion path through the ion guide with a central axis of the pupils defining the ion path, and wherein neighboring electrode rings are coupled to a RF-only voltage supply of an opposing polarity to that of their neighbor so as to operably drive the ions towards the central axis.

41. The ion guide of claim 40 wherein each of the electrodes forming the set of electrode rings include an aperture defined therein, such that the ion guide includes a plurality of apertures.

42. The ion guide of claim 41 wherein the plurality of apertures are aligned with one another.

43. The ion guide of claim 41 wherein at least some of the structures have grooves formed in an upper surface thereof.

44. The ion guide of claim 40 wherein the plurality of apertures form a set of closed pupils.

45. The ion guide of claim 40 wherein the compatible structures are upstanding from and proud of their respective substrates.

Assignments (5)
CHANGE OF NAME Recorded Jun 14, 2011
From: MICROSAIC SYSTEMS LIMITED
To: MICROSAIC SYSTEMS PLC
Reel/Frame 026438/0428 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2009
From: SYMS, RICHARD
To: IMPERIAL COLLEGE OF SCIENCE, TECHNOLOGY AND MEDICINE
Reel/Frame 023076/0827 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2009
From: IMPERIAL COLLEGE OF SCIENCE, TECHNOLOGY AND MEDICINE
To: IMPERIAL INNOVATIONS, LTD.
Reel/Frame 023076/0848 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2009
From: FINLAY, ALAN
To: MICROSAIC SYSTEMS LIMITED
Reel/Frame 023076/0854 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2009
From: IMPERIAL INNOVATIONS, LTD.
To: MICROSAIC SYSTEMS LIMITED
Reel/Frame 023076/0898 →
Priority Claims (1)
GB 0714316.7 · Jul 23, 2007 · national
Continuity (1)
Related Publication 20090026361A1 · Jan 29, 2009