Charged particle beam equipment and charged particle microscopy
View Patent ↗On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
1. A charged particle beam apparatus for obtaining an image of a specimen by scanning a charged particle beam on the specimen with a scanner, and a lens system for focusing the charged particle beam, comprising:
a charged particle beam source for generating the charged particle beam;
a specimen stage for mounting and moving the specimen;
a beam deflector for deflecting said charged particle beam;
a detector for detecting electrons caused by an interaction of the charged particle beam and the specimen;
an arithmetic processing part for performing an image operation; and
a display part for displaying the image of the specimen, wherein:
said arithmetic processing part obtains a first displacement of a part on a first image captured in a first magnification and a second displacement of a part on a second image captured in a second magnification,
each displacement is obtained by giving a same amount of deflection to the beam deflector, wherein the amount of displacement is based on a measured pitch distance at each magnification, and
said arithmetic processing part determines a magnification error based on a difference between the first displacement and the second displacement converted by using a value of the first magnification and a value of the second magnification, and calculates a calibrated magnification using the magnification error.
2. The charged particle beam apparatus according to claim 1 , wherein said first displacement is an average value of displacements of a plurality of first images captured repeatedly by giving the same amount of deflection to the beam deflector.
3. The charged particle beam apparatus according to claim 1 , wherein said second displacement is an average value of displacements of a plurality of second images captured repeatedly by giving the same amount of deflection to the beam deflector.