IP Library › Granted Patent US 7,856,288
Granted Patent B2
US 7,856,288 · App. 12/237,435 · Granted Dec 21, 2010

Imprint system and imprint method

Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 7,856,288
App. No.
12/237,435
Granted
Dec 21, 2010
Kind
B2
Abstract

An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon the template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon said remaining film thickness set value information, calculates a pattern density of the template from the template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from the vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, the distribution of an applied amount for filling a pattern, and the distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member, and an application section which applies the imprint member on the substrate based upon the distribution of an applied amount of the imprint member.

Claims (20)

1. An imprint system, comprising:

a design data storing section which stores template information including a position and a depth of a concave-convex pattern of a template, and remaining film thickness set value information including a film thickness of a remaining film uniformly formed on a substrate;

a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, each showing an applied position and an applied amount of an imprint member that compensates the imprint member to vaporize in accordance with pattern densities of said template;

an arithmetic section which

calculates a distribution of an applied amount for filling a pattern, showing an applied position and an applied amount of the imprint member corresponding to the imprint member to fill the inside of said concave-convex pattern based upon said template information,

calculates a distribution of an applied amount for forming a remaining film thickness, showing an applied position and an applied amount of the imprint member corresponding to the imprint member to form the remaining film based upon said remaining film thickness set value information,

calculates a pattern density of the template from said template information,

extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from said vaporization-to-be-compensated storing section, and

adds up this extracted distribution of an applied amount for compensating vaporization, said distribution of an applied amount for filling a pattern, and said distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member; and

an application section which applies the imprint member on the substrate based upon said distribution of an applied amount of the imprint member.

2. The imprint system according to claim 1 , wherein said arithmetic section calculates said pattern density with respect to each arbitrary region within said template, and extracts a distribution of an applied amount for compensating vaporization, corresponding to said each region, from said vaporization-to-be-compensated storing section.

3. The imprint system according to claim 1 , wherein said arithmetic section calculates a ratio of a concave section of a concave-convex pattern in an arbitrary region of said template as said pattern density.

4. An imprint method, comprising:

calculating a distribution of an applied amount for filling a pattern, showing an applied position and an applied amount of an imprint member corresponding to the imprint member to fill the inside of a concave-convex pattern of a template based upon template information including a position and a depth of said concave-convex pattern;

calculating a distribution of an applied amount for forming a remaining film thickness, showing an applied position and an applied amount of the imprint member corresponding to the imprint member to form a remaining film that is uniformly formed on a substrate based upon remaining film thickness set value information including a film thickness of the remaining film;

calculating a pattern density of said template based upon said template information;

adding up a distribution of an applied amount for compensating vaporization, showing an applied position and an applied amount of the imprint member that compensates the imprint member to vaporize in accordance with said calculated pattern density, said distribution of an applied amount for filling a pattern, and said distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member; and

applying the imprint member on the substrate based upon said distribution of an applied amount of the imprint member.

5. The imprint method according to claim 4 , wherein the pattern density of said template is calculated with respect to each arbitrary region within said template, and a distribution of an applied amount for compensating vaporization corresponding to said pattern density, said distribution of an applied amount for filling a pattern, and said distribution of an applied amount for forming a remaining film thickness are added up, to calculate the distribution of an applied amount of the imprint member.

6. The imprint method according to claim 4 , wherein a ratio of a concave section of a concave-convex pattern in an arbitrary region of said template is calculated as said pattern density.

Assignments (5)
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 5, 2008
From: YONEDA, IKUO; MIKAMI, SHINJI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 021959/0544 →
Priority Claims (1)
JP 2007-258525 · Oct 2, 2007 · national
Continuity (1)
Related Publication 20090267268A1 · Oct 29, 2009