Plasma processing apparatus
View Patent ↗A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing electrode where a processing material, is placed and which holds the processing material in the chamber; and a vacuuming unit that is connected to the chamber to discharge the gas in the chamber, in which the chamber, a part for providing gas into the chamber of the gas supply unit, a part for introducing a microwave into the chamber of the microwave supply unit, the object-placing electrode, and the vacuuming unit are disposed coaxially with the center axis of the chamber, and the part for introducing a microwave includes a microwave rotation generator that rotates a polarization plane of the input microwave and supplies the microwave to the chamber.
1. A plasma processing apparatus comprising:
a decompression chamber of which the inside is decompressed;
a gas supply unit that supplies process gas into the decompression chamber;
a microwave supply unit that supplies a microwave into the decompression chamber to generate plasma;
at least one coil forming a magnetic field in the decompression chamber;
an object-placing electrode where a processing material, which is an object to be processed, is placed and which holds the processing material in the decompression chamber; and
a vacuuming unit that is connected to the decompression chamber to discharge the gas in the decompression chamber;
wherein the decompression chamber, a part for providing gas into the chamber of the gas supply unit, a part for introducing a microwave into the chamber of the microwave supply unit, the at least one coil, the object-placing electrode, and the vacuuming unit are disposed coaxially with a center axis of the decompression chamber;
wherein the part for introducing a microwave includes a microwave rotation generator provided with a rectangular dielectric plate and a cylindrical dielectric plate guide having axially-symmetric opposing grooves therein for receiving and supporting the rectangular dielectric plate, the microwave rotation generator having a cross-sectional dimension enabling only the microwave of TE 11 mode to be transmitted, wherein a distance between bottoms of the opposing grooves of the cylindrical dielectric plate guide is larger than an inner diameter of a circular wave guide connected with the cylindrical dielectric plate guide of the microwave rotation generator; and
wherein a polarization plane of the input microwave is rotated right or left, thereby, the microwave of the TE 11 mode being generated, the generated microwave of TE 11 mode being supplied to the decompression chamber through the circular waveguide exclusively having a dimension enabling the generated microwave of TE 11 mode transmitted.
2. The plasma processing apparatus according to claim 1 , wherein the object-placing electrode has coolant grooves that are disposed coaxially with a center axis of the object placing electrode to allow a coolant to flow.
3. The plasma processing apparatus according to claim 1 , wherein the object-placing electrode has heaters that are disposed coaxially with a center axis of the object placing electrode to heat the object.
4. The plasma processing apparatus according to claim 1 , wherein a rotational direction of the polarization plane of the microwave and a rotational direction of electrons generated by the microwave and the magnetic field around lines of a magnetic force are the same.
5. The plasma processing apparatus according to claim 1 , wherein an inner diameter of the cylindrical dielectric plate guide is smaller than the distance between the bottoms of the opposing grooves of the cylindrical dielectric plate guide.