IP Library Granted Patent US 8,410,712
Granted Patent B2
US 8,410,712 · App. 12/253,399 · Granted Apr 2, 2013

Method and apparatus for curing thin films on low-temperature substrates at high speeds

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Quick Facts
Patent No.
US 8,410,712
App. No.
12/253,399
Granted
Apr 2, 2013
Kind
B2
Abstract

A curing apparatus for thermally processing thin films on low-temperature substrates at high speeds is disclosed. The curing apparatus includes a strobe head, a strobe control module and a conveyor control module. The strobe control module controls the power, duration and repetition rate of a set of pulses generated by a flash lamp on the strobe head. The conveyor control module along with the strobe control module provide real-time synchronization between the repetition rate of the set of pulses and the speed at which the substrate is being moved under the strobe head, according to the speed information.

Claims (29)

1. A curing apparatus comprising:

a conveyor system for transporting a layer of thin film mounted on a low-temperature substrate;

a strobe head having a flash lamp for providing a plurality of electromagnetic pulses to said layer of thin film;

a strobe control module for controlling power, duration and repetition rate of said plurality of electromagnetic pulses generated by said flash lamp; and

a conveyor control module, in conjunction with said strobe control module, for synchronizing in real-time said repetition rate of said plurality of electromagnetic pulses with the speed at which said low-temperature substrate is being moved pass said strobe head; and

an air knife for cooling said thin film after said thin film has been exposed to one of said electromagnetic pulses.

2. The curing apparatus of claim 1 , wherein said flash lamp is a xenon flash lamp.

3. The curing apparatus of claim 2 , wherein said xenon flash lamp is capable of generating pulses from 10 μs to 10 ms at a pulse repetition rate of up to 1 kHz.

4. The curing apparatus of claim 2 , wherein the spectral content of said xenon flash lamp ranges from 200 nm to 2,500 nm.

5. The curing apparatus of claim 1 , wherein said flash lamp is a Directed Plasma Arc lamp.

6. The curing apparatus of claim 1 , wherein said curing apparatus further includes a feeder for feeding said low-temperature substrate to said conveyor system.

7. The curing apparatus of claim 1 , wherein said curing apparatus further includes a sensor for sensing the speed at which said low-temperature substrate is being moved pass said flash lamp.

8. The curing apparatus of claim 1 , wherein said thin film is less than 100 microns thick.

9. The curing apparatus of claim 1 , wherein said low-temperature substrate is made of paper.

10. The curing apparatus of claim 1 , wherein said low-temperature substrate is made of polymer.

11. The curing apparatus of claim 1 , wherein said speed synchronization is given by:

f

=

0.2

*

S

*

O

W

wherein

f=pulse repetition rate [Hz]

S=speed at which said low-temperature substrate is being moved [ft/min]

O=overlap factor

W=width of said strobe head [in].

Assignments (2)
NUNC PRO TUNC ASSIGNMENT Recorded Jun 5, 2025
From: NCC NANO, LLC
To: PULSEFORGE, INC.
Reel/Frame 071520/0873 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 5, 2009
From: SCHRODER, KURT A.; MARTIN, KARL M.; JACKSON, DOUG K.; MCCOOL, STEVEN C.
To: NCC NANO, LLC
Reel/Frame 022213/0623 →