Plasma processing apparatus
This application discloses a practical plasma processing apparatus capable of plasma confinement without plasma-density non-uniformity and electric power loss. The apparatus comprises a plasma shield that surrounds a plasma generation region to prevent plasma from diffusing. The shield has at least one opening. The apparatus comprises a diffusion prevention electrode for preventing the plasma from diffusing through the opening of the plasma shield. The surface of the plasma shield exposed to the plasma is made of insulator. The diffusion prevention electrode is located where electrons diffusing toward the opening or having diffused through the opening from the plasma flow into itself.
1. A plasma processing apparatus, comprising:
a process chamber;
a pumping line;
a gas introduction line configured and positioned to introduce a gas into the process chamber;
a substrate holder that is provided in the process chamber and comprises a top surface on which a substrate to be processed by plasma is held;
an opposite electrode located higher than the substrate holder and facing the substrate holder,
a plasma power source to apply voltage to the opposite electrode or the substrate holder to generate the plasma at a plasma generation region between the substrate holder and the opposite electrode;
a plasma shield that surrounds the plasma generation region between the substrate holder and the opposite electrode to prevent the plasma from diffusing; and
a surface of the plasma shield exposed to the plasma is made of electrically insulating material,
the plasma shield interconnects an upper wall and a bottom wall of the process chamber to partition the process chamber, and an evacuation room to which the pumping line is connected is outside the plasma shield in the process chamber,
the plasma shield has an evacuation opening,
the evacuation opening provided in the plasma shield is located lower than the top surface of the substrate holder, and
a diffusion prevention electrode, wherein
the diffusion prevention electrode is located where electrons diffusing to or having diffused through the evacuation opening, to prevent the plasma from diffusing through the evacuation opening, and
the diffusion prevention electrode is located lower than the top surface of the substrate holder on which the substrate is placed, and is located adjacent to or in the evacuation opening.
2. A plasma processing apparatus as claimed in claim 1 , wherein the diffusion prevention electrode is grounded.
3. A plasma processing apparatus as claimed in claim 1 , further comprising a power source connected to the diffusion prevention electrode to apply voltage.
4. A plasma processing apparatus as claimed in claim 1 , wherein the diffusion prevention electrode releases material not producing contamination when etched.
5. A plasma processing apparatus as claimed in claim 4 , wherein the gas is carbon fluoride, the substrate is etched by the plasma, and the diffusion prevention electrode is made of carbon.
6. A plasma processing apparatus as claimed in claim 4 , wherein the substrate is made of silicon, and the diffusion prevention electrode is made of silicon.
7. A plasma processing apparatus, comprising:
a process chamber;
a pumping line;
a gas introduction line configured and positioned to a gas into a plasma generation region in the process chamber;
a plasma generator for generating plasma at the plasma generation region provided above a top surface of a substrate holder by applying energy to the introduced gas;
the substrate holder is provided in the process chamber and the top surface of the substrate holder is provided to hold a substrate to be processed by the plasma;
a plasma shield that surrounds the plasma generation region above the top surface of the substrate holder to prevent the plasma from diffusing;
a diffusion prevention electrode; and
a power source that applies voltage to the diffusion prevention electrode, wherein
a surface of the plasma shield exposed to the plasma is made of electrically insulating material,
the plasma shield has at least one opening, and
the diffusion prevention electrode is located where electrons diffusing to or having diffused through the at least one opening flow in, to prevent the plasma from diffusing through the at least one opening.
8. A plasma processing apparatus as claimed in claim 7 , wherein the diffusion prevention electrode releases material not producing contamination when etched.
9. A plasma processing apparatus as claimed in claim 8 , wherein the gas is carbon fluoride, the substrate is etched by the plasma, and the diffusion prevention electrode is made of carbon.
10. A plasma processing apparatus as claimed in claim 8 , wherein the substrate is made of silicon, and the diffusion prevention electrode is made of silicon.