Apparatus and method for smoothly coating substrates
View Patent ↗The surface of a substrate may be smoothly covered with a liquid when the substrate is fixed in a holder which together with forms, together with the surface of the substrate, a process volume into which the liquid may be introduced onto the surface of the substrate by means of a wetter, and when the holder including the substrate is set in a swaying motion by means of a swayer, so that the liquid will smoothly spread on the surface of the substrate. By the swaying motion, concentration of the volume of liquid at a specific location of the substrate surface is prevented, since the direction of motion of the liquid changes constantly.
1. An apparatus for smoothly covering a surface of a substrate with a liquid, comprising:
a holder for the substrate, which is implemented to fix the substrate such that a process volume is formed by the surface of the substrate and the holder;
a wetter implemented to introduce the liquid into the process volume onto the surface of the substrate; and
a swayer implemented to tilt the holder comprising the substrate relative to first and second axes so that the substrate does not undergo, as averaged over time, any rotation; the first and second axes being arranged in a plane parallel to the surface of the substrate and forming a predetermined angle relative to each other so as to thereby distribute the liquid on the surface of the substrate.
2. The apparatus as claimed in claim 1 , wherein the swayer comprises three supporters which are controllable independently of one another and are mounted on the holder so as to stabilize it, the supporters being able to perform, independently of one another, a movement in a direction which is essentially perpendicular to the surface of the substrate.
3. The apparatus as claimed in claim 2 , wherein the supporters are hydraulic supports.
4. The apparatus as claimed in claim 2 , wherein the supporters comprise push rods, each of which is eccentrically attached to a rotating carrier, the push rods performing the movement in the direction which is essentially perpendicular to the surface of the substrate.
5. The apparatus as claimed in claim 4 , wherein the supporters are implemented such that the eccentricity of the attachment of the push rods is adjustable to vary a stroke of the movement in the direction which is essentially perpendicular to the surface of the substrate.
6. The apparatus as claimed in claim 1 , wherein the wetter comprises several inlet nozzles for simultaneously introducing different liquids.
7. The apparatus as claimed in claim 6 , wherein the wetter comprises a mixer implemented to mix the different liquids.
8. The apparatus as claimed in claim 1 , wherein the wetter is implemented to introduce one or more of the following reagents into the process volume:
ammonia water,
cadmium sulphate,
cadmium acetate,
thiourea,
deionized water.
9. The apparatus as claimed in claim 1 , wherein the holder is implemented to fix a flat substrate wherein the lateral extensions are at least ten times larger than the thickness of the substrate.
10. The apparatus as claimed in claim 1 , wherein the holder is implemented to fix a glass substrate.
11. The apparatus as claimed in claim 1 , wherein the holder is implemented to fix the substrate such that in a closed state of the holder at least 95% of the surface of the substrate is freely accessible to the liquid from the side of the process volume.
12. The apparatus as claimed in claim 1 , wherein the holder is implemented to fix substrates comprising varying thicknesses within a predetermined range of thicknesses.
13. The apparatus as claimed in claim 1 , wherein the holder is implemented to form, with the substrate fixed, a self-contained process volume so that in a closed state of the holder the liquid cannot leave the process volume.
14. The apparatus as claimed in claim 1 , wherein the holder is implemented such that in a closed state, the substrate is pressed between a lid facing the surface of the substrate and a base frame adjoining the underside of the substrate.
15. The apparatus as claimed in claim 1 , wherein the holder is implemented to enable, in an open state of the holder, removing the substrate from the holder and supplying the substrate into the holder.
16. The apparatus as claimed in claim 1 , additionally comprising a draining device implemented to enable draining the liquid from the process volume.
17. The apparatus as claimed in claim 16 , wherein the draining device comprises a valve and a swiveler for swiveling the holder, the valve being arranged in the process volume in such a manner that when a predetermined swiveling angle is reached, the liquid may flow out of the process volume through the valve.
18. The apparatus as claimed in claim 1 , further comprising a heater implemented to heat the substrate from a substrate start temperature to a predetermined reaction temperature.
19. The apparatus as claimed in claim 18 , wherein the heater is implemented to vary a substrate temperature of the substrate such that the substrate temperature is smaller than or equal to a liquid temperature of the liquid applied to the surface of the substrate by the wetter.
20. The apparatus as claimed in claim 18 , wherein the heater is implemented to heat the substrate from the side facing away from the process volume.