Semiconductor integrated device and manufacturing method for the same

1. A semiconductor integrated device, comprising:

a semiconductor substrate;

a first impurity layer of a first conductivity type formed in the semiconductor substrate;

a second impurity layer of a second conductivity type formed above the first impurity layer;

a first well of the first conductivity type formed above the second impurity layer and supplied with potential from the first impurity layer via an impurity region of the first conductivity type selectively formed in a part of the second impurity layer;

a second well of the second conductivity type formed above the second impurity layer and supplied with potential from the second impurity layer,

wherein impurity concentrations of the first impurity layer and the impurity region are higher than that of the first well, and an impurity concentration of the second impurity layer is higher than that of the second well; and

a supply voltage region electrically connecting the second impurity layer, said supply voltage region comprising an opening in the first well that extends from an upper surface of the second impurity layer to an upper surface of the first well.

2. The semiconductor integrated device according to claim 1 , wherein the first impurity layer of the first conductivity type and the second impurity layer of the second conductivity type comprise epitaxial layers.

3. The semiconductor integrated device according to claim 1 , wherein the first impurity layer of the first conductivity type and the second impurity layer of the second conductivity type comprise diffused layers.

4. The semiconductor integrated device according to claim 1 , further comprising:

a first supply voltage supplying region electrically connecting the first impurity layer and a first supply voltage terminal supplying a first supply voltage,

wherein the supply voltage region comprises a second supply voltage supplying region electrically connecting the second impurity, layer and a second supply voltage terminal supplying a second supply voltage, and

wherein the first and second supply voltage supplying regions are formed in an area other than element formed areas.

5. The semiconductor integrated device according to claim 4 , wherein the first impurity layer and the first supply voltage terminal are electrically connected via an impurity layer of the first conductivity type that is higher in impurity concentration than the first well, and the second impurity layer and the second supply voltage terminal are electrically connected via an impurity layer of the second conductivity type that is higher in impurity concentration than the second well.

6. The semiconductor integrated device according to claim 4 , wherein the first impurity layer and the first supply voltage terminal are electrically connected via a metal layer provided in the first supply voltage supplying region, and the second impurity layer and the second supply voltage terminal are electrically connected via a metal layer provided in the second supply voltage supplying region.

7. The semiconductor integrated device according to claim 4 , wherein the first supply voltage terminal and the second supply voltage terminal are positioned on an element formed surface side of the semiconductor integrated device.

8. The semiconductor integrated device according to claim 1 , wherein a semiconductor layer is formed between the first impurity layer of the first conductivity type and the second impurity layer of the second conductivity type, the semiconductor layer being lower in impurity concentration than the first impurity layer of the first conductivity type or the second impurity layer of the second conductivity type.

9. The semiconductor integrated device according to claim 1 , wherein the first impurity layer of the first conductivity type is formed on said substrate that comprises a semiconductor lower in impurity concentration than that of the first well of the first conductivity type or the second well of the second conductivity type.

10. The semiconductor integrated device according to claim 1 , wherein said substrate abuts the first impurity layer of the first conductivity type.

11. The semiconductor integrated device according to claim 1 , wherein said substrate has an impurity concentration lower than the impurity concentration of the second impurity layer.

12. The semiconductor integrated device according to claim 1 , wherein said substrate comprises an insulator.

13. The semiconductor integrated device according to claim 1 , wherein said substrate has the second conductivity type.

14. The semiconductor integrated device according to claim, further comprising:

a supply voltage terminal supplying a supply voltage to the second impurity layer.

15. The semiconductor integrated device according to claim 14 , further comprising:

another supply voltage region electrically connecting the first impurity layer and another supply voltage terminal supplying another supply voltage to the first impurity layer, said another supply voltage region comprising an opening that extends through one of the first well to the upper surface of first well and said substrate to a lower surface of said substrate.

16. The semiconductor integrated device according to claim 14 , wherein said another supply voltage region passes through the second impurity layer.

17. The semiconductor integrated device according to claim 1 , wherein the first well abuts the second well.