Part for rotary machine, and manufacturing method therefor
In a part for a rotary machine, a ceramic hard film is formed on a surface of a base material, the density of droplets which exist in a surface of the ceramic hard film is set to be within 1000 pieces/mm 2 , and the density of droplets whose mean particle diameter is 1 μm or less is set to be within 550 pieces/mm 2 . A method for manufacturing the part of a rotary machine is a method for forming the ceramic hard film by at least an ion plating method or a sputtering method.
1. A part for a rotary machine, the part comprising:
a base material; and
a ceramic hard film formed on a surface of the base material, wherein
a film thickness of the ceramic hard film is within a range of 5 μm or more and 15 μm or less, and
a density of droplets which exist in a surface of the ceramic hard film is set to be within 1000 pieces/mm 2 , and a density of droplets whose mean particle diameter is 1 μm or less is set to be within 550 pieces/mm 2 .
2. The part for a rotary machine of claim 1 ,
wherein the ceramic hard film is made of at least one of TiN, CrN, TiAlN, TiC, TiCN, and ZrN.
3. The part for a rotary machine according to claim 2 , further comprising
an interlayer formed between the base material and the ceramic hard film.
4. The part for a rotary machine according to claim 1 , further comprising
an interlayer formed between the base material and the ceramic hard film.
5. The part for a rotary machine of claim 4 ,
wherein the interlayer is made of Cr or Ti.
6. The part for a rotary machine of claim 4 ,
wherein the interlayer is made of CrN or TiN.
7. The part for a rotary machine of claim 4 ,
wherein the film thickness of the ceramic hard film is greater than a film thickness of the interlayer, and a total film thickness of the ceramic hard film and the interlayer is within a range of 5 μm or more and 20 μm or less.
8. The part for a rotary machine according to claim 4 , wherein
the interlayer is formed by an ion plating method in which an output from electron rays of a plasma gun is 450 (W/cm 2 ) to 550 (W/cm 2 ) and an electromagnetic output is 80 (W/cm 2 ) to 120 (W/cm 2 ).
9. The part for a rotary machine according to claim 1 , wherein
the ceramic hard film is formed by an ion plating method in which an output from electron rays of a plasma gun is 550 (W/cm 2 ) to 980 (W/cm 2 ) and an electromagnetic output is set to a range of 80 (W/cm 2 ) to 120 (W/cm 2 ).