IP Library Granted Patent US 8,295,691
Granted Patent B2
US 8,295,691 · App. 12/334,622 · Granted Oct 23, 2012

Heat treatment apparatus

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,295,691
App. No.
12/334,622
Granted
Oct 23, 2012
Kind
B2
Abstract

In a heat treatment apparatus, a substrate held by a holding part is irradiated with light emitted from halogen lamps to perform preheating thereon and irradiated with a flash of light emitted from flash lamps to perform flash heating thereon. Part of light which is emitted from the halogen lamps and goes toward the flash lamps passes through a window hole formed in a peripheral-light shielding member and enters the substrate held by the holding part, and its energy is used for the preheating on the substrate. On the other hand, the remaining light is blocked out by the peripheral-light shielding member.

Claims (32)

1. A heat treatment apparatus for irradiating a substrate with light to heat the substrate, comprising:

a holding part for holding a substrate;

a first light emitting part comprising a plurality of halogen lamps for emitting light toward a substrate held by said holding part from a position away from said substrate by a predetermined distance;

a second light emitting part comprising a plurality of flash lamps for emitting a flash of light toward a substrate held by said holding part from a position away from said substrate by a predetermined distance; and

a peripheral-light shielding part inserted between said first light emitting part and said holding part, for passing part of light which is emitted from said first light emitting part and goes toward said second light emitting part therethrough to let the part of light enter a substrate held by said holding part, while blocking out the remaining light;

said peripheral-light shielding part comprises:

a plate-like member inserted in parallel with a substrate held by said holding part, and said plate-like member comprises

a window hole formed in its surface area, having a size equal to or smaller than that of a projection image of said substrate, which is orthographically projected on the surface area.

2. The heat treatment apparatus according to claim 1 , wherein

the separation distance between said plate-like member and a substrate held by said holding part is not longer than 30 mm.

3. The heat treatment apparatus according to claim 2 , wherein

said plate-like member is formed of silicon carbide.

4. The heat treatment apparatus according to claim 2 , wherein

said plate-like member is formed of alumina.

5. The heat treatment apparatus according to claim 2 , wherein

said plate-like member is formed of a material that does not transmit light of visible region.

6. A heat treatment apparatus for irradiating a substrate with light to heat the substrate, comprising:

a holding part for holding a substrate;

a first light emitting part comprising a plurality of halogen lamps for emitting light toward a substrate held by said holding part from a position away from said substrate by a predetermined distance;

a second light emitting part comprising a plurality of flash lamps for emitting a flash of light toward a substrate held by said holding part from a position away from said substrate by a predetermined distance; and

a peripheral-light shielding part inserted between said second light emitting part and said holding part, for blocking out light which is emitted from said first light emitting part, not entering a substrate held by said holding part, and goes toward said second light emitting part;

said peripheral-light shielding part comprises:

a plate-like member inserted in parallel with a substrate held by said holding part, and said plate-like member comprises

a window hole formed in its surface area, having a size equal to or smaller than that of a projection image of said substrate, which is orthographically projected on the surface area.

7. The heat treatment apparatus according to claim 1 , wherein

the separation distance between said plate-like member and a substrate held by said holding part is not longer than 30 mm.

8. The heat treatment apparatus according to claim 7 , wherein

said plate-like member is formed of silicon carbide.

9. The heat treatment apparatus according to claim 7 , wherein

said plate-like member is formed of alumina.

10. The heat treatment apparatus according to claim 7 , wherein

said plate-like member is formed of a material that does not transmit light of visible region.

Assignments (2)
CHANGE OF NAME Recorded Mar 12, 2015
From: DAINIPPON SCREEN MFG. CO., LTD.
To: SCREEN HOLDINGS CO., LTD.
Reel/Frame 035248/0483 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 15, 2008
From: KUSUDA, TATSUFUMI
To: DAINIPPON SCREEN MFG. CO., LTD.
Reel/Frame 021977/0806 →