IP Library Granted Patent US 7,955,885
Granted Patent B1
US 7,955,885 · App. 12/351,020 · Granted Jun 7, 2011

Methods of forming packaged micro-electromechanical devices

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Quick Facts
Patent No.
US 7,955,885
App. No.
12/351,020
Granted
Jun 7, 2011
Kind
B1
Abstract

Methods of forming packaged micro-electromechanical devices include forming a first substrate having a micro-electromechanical device therein, which extends adjacent a first surface of the first substrate. A first surface of a second substrate is then bonded to the first surface of the first substrate, to thereby encapsulate the micro-electromechanical device within a space provided between the first and second substrates. Subsequent to bonding, a second surface of the second substrate is selectively etched to define at least one through-substrate opening therein, which exposes an electrode of the micro-electromechanical device. Thereafter, the through-substrate opening is filled with an electrically conductive through-substrate via.

Claims (16)

1. A method of forming a packaged micro-electromechanical device, comprising:

forming a first substrate having a micro-electromechanical device therein adjacent a first surface thereof;

bonding a first surface of a second substrate to the first surface of the first substrate; then

selectively etching a second surface of the second substrate for a sufficient duration to define a through-substrate opening therein that exposes an electrode of the micro-electromechanical device; and

filling the through-substrate opening with an electrically conductive through-substrate via that contacts the exposed electrode concurrently with forming a seal ring that extends on the first and second surfaces of the first and second substrates, respectively, and hermetically seals the first and second substrates together, by conformally depositing a metal layer onto the first and second substrates and then patterning the deposited metal layer into the through-substrate via and the seal ring.

2. The method of claim 1 , wherein the metal layer comprises AlCu.

3. The method of claim 1 , wherein the seal ring defines a ring-shaped flange that surrounds the second substrate.

4. The method of claim 1 , wherein said bonding is preceded by a step of forming a polymer layer on the first surface of the second substrate; and wherein said bonding comprises bonding at least a portion of the polymer layer to at least a portion of the micro-electromechanical device.

5. The method of claim 4 , wherein said bonding comprises bonding at least a portion of the polymer layer to the electrode of the micro-electromechanical device.

6. A method of forming a packaged micro-electromechanical device, comprising:

forming a first substrate having a micro-electromechanical device therein adjacent a first surface thereof;

bonding a first surface of a second substrate to the first surface of the first substrate; then

selectively etching the second surface of the second substrate for a sufficient duration to define a through-substrate opening therein that exposes a portion of the micro-electromechanical device;

depositing an electrically conductive metal layer on the second surface of the second substrate and on the first surface of the first substrate and into the through-substrate opening; and

patterning the electrically conductive metal layer to define a seal ring that hermetically seals the first and second substrates together and concurrently define a through-substrate via that contacts the exposed portion of the micro-electromechanical device.

7. The method of claim 6 , wherein said depositing is preceded by a step of thinning the second substrate.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Mar 29, 2019
From: JPMORGAN CHASE BANK, N.A.
To: INTEGRATED DEVICE TECHNOLOGY, INC.; GIGPEAK, INC.; CHIPX, INCORPORATED; ENDWAVE CORPORATION; MAGNUM SEMICONDUCTOR, INC.
Reel/Frame 048746/0001 →
SECURITY AGREEMENT Recorded Apr 5, 2017
From: INTEGRATED DEVICE TECHNOLOGY, INC.; GIGPEAK, INC.; MAGNUM SEMICONDUCTOR, INC.; ENDWAVE CORPORATION; CHIPX, INCORPORATED
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 042166/0431 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 30, 2009
From: BHUGRA, HARMEET; LEI, KUOLUNG; WANG, YE
To: INTEGRATED DEVICE TECHNOLOGY, INC.
Reel/Frame 022180/0518 →