POSITIVE PHOTOSENSITIVE POLYMER COMPOSITION
A positive photosensitive polymer composition of the invention contains: a copolymer obtained by the radical polymerization of monomers including a radical polymerizable monomer (a1) having a (meth)acryloyl group and a polyalkylene glycol group a terminal of which is an alkoxy group; and a 1,2-quinone diazide compound. The positive photosensitive polymer composition may further contain a copolymer obtained by the radical polymerization of monomers not including the monomer (a1).
1 . A photosensitive polymer composition, comprising:
a copolymer (A) obtained by polymerizing a radical polymerizable monomer (a1) represented by the following formula (I) and another radical polymerizable monomer (a2); and
a 1,2-quinone diazide compound (B):
where R 1 represents hydrogen or an alkyl group having 1 to 5 carbon atoms in which arbitrary hydrogen may be replaced by fluorine, R 2 represents an alkylene group having 1 to 5 carbon atoms, R 3 represents an alkyl group having 1 to 10 carbon atoms, and n represents an integer of 1 to 30.
2 . The photosensitive polymer composition according to claim 1 , wherein the radical polymerizable monomer (a1) comprises one or more kinds selected from the group consisting of methoxy polyethylene glycol (meth)acrylate, ethoxy polyethylene glycol (meth)acrylate, methoxy polypropylene glycol (meth)acrylate, and ethoxy polypropylene glycol (meth)acrylate.
3 . The photosensitive polymer composition according to claim 1 , wherein the radical polymerizable monomer (a2) comprises one or more kinds selected from the group consisting of a radical polymerizable monomer having an unsaturated carboxylic acid, a radical polymerizable monomer having an unsaturated carboxylic anhydride, a radical polymerizable monomer having a phenolic OH, a radical polymerizable monomer having an epoxy, a radical polymerizable monomer represented by the following formula (III), a radical polymerizable monomer containing an N-substituted maleimide, and a radical polymerizable monomer containing a dicyclopentanyl:
where R 12 represents hydrogen or an alkyl group having 1 to 5 carbon atoms in which arbitrary hydrogen may be replaced by fluorine, R 13 , R 14 , and R 15 each represent a hydroxyl group, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or —O—(Si(C j H 2j+1 ) 2 O) p Si(C k H 2k+1 ) 3 , j represents an integer of 1 to 5, k represents an integer of 1 to 5, p represents 0 or an integer of 1 to 10, and m represents an integer of 1 to 5.
4 . The photosensitive polymer composition according to claim 3 , wherein the radical polymerizable monomer having an unsaturated carboxylic acid is (meth)acrylic acid.
5 . The photosensitive polymer composition according to claim 3 , wherein the radical polymerizable monomer having an unsaturated carboxylic anhydride is maleic anhydride.
6 . The photosensitive polymer composition according claim 3 , wherein the radical polymerizable monomer having a phenolic OH is one or both of hydroxystyrene and a compound represented by the following formula (II):
where R 4 , R 5 , and R 6 each represent hydrogen or an alkyl group having 1 to 3 carbon atoms in which arbitrary hydrogen may be replaced by fluorine, R 7 , R 8 , R 9 , R 10 , and R 11 each represent hydrogen, a halogen, —CN, —CF 3 , —OCF 3 , —OH, an alkyl group having 1 to 5 carbon atoms in which arbitrary —CH 2 — may be replaced by —COO—, —OCO—, or —CO— and arbitrary hydrogen may be replaced by a halogen, or an alkoxy group having 1 to 5 carbon atoms in which arbitrary hydrogen may be replaced by a halogen, provided that one or more of R 7 to R 11 represents —OH.
7 . The photosensitive polymer composition according to claim 6 , wherein the compound represented by the formula (II) is 4-hydroxyphenyl vinyl ketone.
8 . The photosensitive polymer composition according claim 3 , wherein the radical polymerizable monomer having an epoxy is one or more kinds selected from the group consisting of glycidyl (meth)acrylate, methylglycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, (3-methyl-3-oxetanyl)methyl (meth)acrylate, (3-ethyl-3-oxetanyl)methyl (meth)acrylate, (3-methyl-3-oxetanyl)ethyl (meth)acrylate, and (3-ethyl-3-oxetanyl)ethyl (meth)acrylate.
9 . The photosensitive polymer composition according to claim 3 , wherein the radical polymerizable monomer containing an N-substituted maleimide is one or more kinds selected from the group consisting of N-methylmaleimide, N-ethylmaleimide, N-butylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-phenylmaleimide, N-(4-acetylphenyl)maleimide, N-(2,6-diethylphenyl)maleimide, N-(4-dimethylamino-3,5-dinitrophenyl)maleimide, N-(1-anilinonaphthyl-4)maleimide, N-[4-(2-benzoxazolyl)phenyl]maleimide, and N-(9-acridinyl)maleimide.
10 . The photosensitive polymer composition according to claim 3 , wherein the radical polymerizable monomer containing a dicyclopentanyl is dicyclopentanyl (meth)acrylate.
11 . The photosensitive polymer composition according to claim 1 , wherein the 1,2-quinone diazide compound (B) is a condensation product of 4,4′-[1-[4-[1-[4-hydroxyphenyl]-1-methylethyl]phenyl]ethylidene]bisphenol and 1,2-naphthoquinone diazide-5-sulfonic acid chloride.
12 . The photosensitive polymer composition according to claim 1 , further comprising a compound having an epoxy.
13 . The photosensitive polymer composition according to claim 1 , further comprising a copolymer (C) obtained by polymerizing two or more kinds of the radical polymerizable monomers (a2).
14 . The photosensitive polymer composition according to claim 13 , wherein the radical polymerizable monomers (a2) in the copolymer (C) include the radical polymerizable monomer (a2) according to claim 3 .
15 . The photosensitive polymer composition according to claim 1 , further comprising a hindered phenol antioxidant.
16 . A patterned transparent film obtained by exposure to an applied film of the photosensitive polymer composition according to claim 1 through a mask having openings in accordance with a desired pattern, development, and baking.
17 . A patterned transparent film obtained by exposure to an applied film of the photosensitive polymer composition according to claim 1 through a mask having openings in accordance with a desired pattern, development, postexposure, and baking.
18 . The patterned transparent film according to claim 16 , wherein the patterned transparent film is an insulating film.
19 . A display device comprising the patterned transparent film according to claim 16 .
20 . The patterned transparent film according to claim 17 , wherein the patterned transparent film is an insulating film.
21 . A display device comprising the patterned transparent film according to claim 17 .
22 . A display device comprising the patterned transparent film according to claim 18 .