Site selective optical proximity correction
View Patent ↗Techniques for performing optical proximity correction on a layout design or portion thereof are provided with various implementations of the invention. With various implementations of the invention, movement and simulation of selected edge fragments is disabled during the optical proximity correction process. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is then performed for the edge fragments that remain enabled. With further implementations of the invention, a simulation site is defined for ones of the edge fragments. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is performed for each simulation site. Additionally, during the optical proximity correction process, the simulations sites may be moved and or removed individually based on various conditions.
1. A computer implemented method comprising:
implementing one or more iterations of a first optical proximity correction process on a computer, wherein the first optical proximity correction process alters a portion of a layout design for an integrated circuit having a plurality of edge segments, by deriving a displacement value relative to a reference location for selected edge segments and adjusting the location of the selected edge segments based upon the derived displacement values;
classifying selected ones of the plurality of edge segments as stable based in part upon the derived displacement values; and
implementing one or more iterations of a second optical proximity correction process on a computer, wherein the second optical proximity correction process alters the portion of the layout design for the integrated circuit, by deriving a displacement value relative to a reference location for selected edge segments not classified as stable and adjusting the location of the selected edge segments based upon the derived displacement values.
2. The method recited in claim 1 , further comprising:
classifying selected ones of the plurality of edge segments as stable based in part upon the derived displacement values from the second optical proximity correction process; and
implementing one or more iterations of a third optical proximity correction process on a computer, wherein the third optical proximity correction process alters the portion of the layout design for the integrated circuit, by deriving a displacement value relative to a reference location for selected edge segments not classified as stable and adjusting the location of the selected edge segments based upon the derived displacement values.
3. The computer implemented method recited in claim 2 , wherein the optical proximity correction process simulates an optical lithographic process and the displacement values are derived based in part upon the size of the numerical aperture of the optical lithographic process, the wavelength of light employed in the optical lithographic process, and an edge placement error value.
4. The computer implemented method recited in claim 3 , wherein ones of the derived displacement values oscillate around the displacement value that would produce an edge placement error of zero during the optical lithographic process simulation and wherein ones of the plurality of edge fragments are classified as stable if the oscillation is within a threshold level.
5. The computer implemented method recited in claim 3 , wherein edge ones of the plurality of edge fragments are classified as stable if the edge placement error is less than a threshold value.
6. The computer implemented method recited in claim 3 , wherein ones of the plurality of edge segments are classified as stable if the derived displacement value is less than a threshold value.
7. The computer implemented method recited in claim 3 , wherein ones of the plurality of edge segments are classified as stable if the edge segment is within a specified distance from another edge segment that has been classified as stable.
8. A computer program product comprising:
software instructions for enabling a computer to perform a set of predetermined operations; and
a computer storage device having the software instructions stored therein;
the set of predetermined operations including:
implementing one or more iterations of a first optical proximity correction process on a computer, wherein the first optical proximity correction process alters a portion of a layout design for an integrated circuit having a plurality of edge segments, by deriving a displacement value relative to a reference location for selected edge segments and adjusting the location of the selected edge segments based upon the derived displacement values;
classifying selected ones of the plurality of edge segments as stable based in part upon the derived displacement values;
implementing one or more iterations of a second optical proximity correction process on a computer, wherein the second optical proximity correction process alters the portion of the layout design for the integrated circuit, by deriving a displacement value relative to a reference location for selected edge segments not classified as stable and adjusting the location of the selected edge segments based upon the derived displacement values; and
storing the altered portion of the layout design to a memory storage location.
9. The computer program product recited in claim 8 , wherein the set of operations further comprises:
classifying selected ones of the plurality of edge segments as stable based in part upon the derived displacement values from the second optical proximity correction process; and
implementing one or more iterations of a third optical proximity correction process on a computer, wherein the third optical proximity correction process alters the portion of the layout design for the integrated circuit, by deriving a displacement value relative to a reference location for selected edge segments not classified as stable and adjusting the location of the selected edge segments based upon the derived displacement values.