Safe liquid source containers
Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass conductance is provided to release excess pressure from the gas volume inside the container, or an enlarged bubbler tube is provided with a volume sufficient to accommodate all possible liquid backflow without having the liquid exit the container. Among the overflow designs, flow dividers provide a tortuous path for the gas to increase the time exposure of carrier gas packets to the evaporating liquid surface. The flow dividers can be microporous to encourage capillary action, thereby increasing the evaporating surface. The tortuous gas flow path can be separated from the liquid phase by a breathable semi-porous membrane that permits vapor phase reactant to pass through but prohibits liquid from passing in the other direction.
1. A liquid source chemical vaporizer for vaporizing liquid source chemical and delivering vapor phase chemical to a vapor deposition reactor, the source chemical vaporizer comprising:
an outer container configured to hold liquid source chemical, the outer container at least partially defining a source container volume;
a carrier gas inlet in communication with the source container volume;
a gas mixture outlet in communication with the vapor deposition reactor and the source container volume; and
an inlet container at least partially defining an inner space volume, the inlet container comprising a bottom edge and having an opening proximate to a bottom of the outer container, the inner space volume being greater than about 15% of the source container volume.
2. The source chemical vaporizer of claim 1 , wherein the inner space volume is greater than about 40% of the source container volume.
3. The source chemical vaporizer of claim 1 , wherein the outer container and a fill level of the liquid source chemical at least partially define an inner gas volume within the outer container, wherein the carrier gas inlet is in communication with the inner gas volume, and wherein the gas mixture outlet is in communication with the inner gas volume.
4. The source chemical vaporizer of claim 1 , wherein the outer container has a horizontal cross-sectional area and the inlet container has a horizontal cross-sectional area, wherein the horizontal cross-sectional area of the inlet container is greater than about 40% of the horizontal cross-sectional area of the outer container.
5. The source chemical vaporizer of claim 1 , wherein the outer container has a horizontal cross-sectional area and the inlet container has a horizontal cross-sectional area, wherein the horizontal cross-sectional area of the inlet container is greater than about 50% of the horizontal cross-sectional area of the outer container.
6. The source chemical vaporizer of claim 1 , wherein the inlet container has a horizontal cross-sectional area and the opening of the bottom edge of the inlet container has a horizontal cross-sectional area, wherein the horizontal cross-sectional area of the opening of the bottom edge of the inlet container is smaller than the horizontal cross-sectional area of the inlet container.
7. The source chemical vaporizer of claim 6 , wherein the horizontal cross-sectional area of the opening of the bottom edge of the inlet container is less than about 10% of the horizontal cross-sectional area of the inlet container.
8. The source chemical vaporizer of claim 6 , wherein the horizontal cross-sectional area of the opening of the bottom edge of the inlet container is less than about 5% of the horizontal cross-sectional area of the inlet container.
9. The source chemical vaporizer of claim 1 , further comprising a coarse sinter at the opening of the bottom edge of the inlet container.
10. A liquid source chemical vaporizer comprising:
a tank having a tank volume and holding a volume of liquid source chemical at a liquid fill level, the tank at least partially defining an inner gas volume above the liquid fill level;
a gas outlet in communication with a vapor deposition reactor and the inner gas volume of the tank; and
a bubbler tube at least partially defining a gas flow path from a gas inlet to the gas outlet, the bubbler tube having a lower edge below the liquid fill level, the bubbler tube at least partially defining a bubbler tube volume, the volume of the liquid source chemical above the lower edge of the bubbler tube being smaller than the bubbler tube volume.
11. The source chemical vaporizer of claim 10 , wherein the bubbler tube volume is greater than about 15% of the tank volume.
12. The source chemical vaporizer of claim 10 , wherein the bubbler tube volume is greater than about 40% of the tank volume.
13. The source chemical vaporizer of claim 10 , wherein the tank has a horizontal cross-sectional area and wherein the bubbler tube has a horizontal cross-sectional area, wherein the horizontal cross-sectional area of the bubbler tube is greater than about 40% of the horizontal cross-sectional area of the tank.
14. The source chemical vaporizer of claim 10 , wherein the tank has a horizontal cross-sectional area and wherein the bubbler tube has a horizontal cross-sectional area, wherein the horizontal cross-sectional area of the bubbler tube is greater than about 50% of the horizontal cross-sectional area of the tank.
15. The source chemical vaporizer of claim 10 , wherein the tank has a horizontal cross-sectional area and wherein the lower edge of the bubbler tube includes an opening having a horizontal cross-sectional area smaller than the horizontal cross-sectional area of the bubbler tube.
16. The source chemical vaporizer of claim 15 , wherein the horizontal cross-sectional area of the opening is less than about 10% of the horizontal cross-sectional area of the bubbler tube.
17. The source chemical vaporizer of claim 15 , wherein the horizontal cross-sectional area of the opening is less than about 5% of the horizontal cross-sectional area of the bubbler tube.
18. The source chemical vaporizer of claim 10 , wherein the lower edge of the bubbler tube includes a coarse sinter.
19. A liquid source bubbler system comprising:
a container configured to hold liquid source chemical;
a bubbler tube in communication with a gas source, the bubbler tube extending into an opening within a liquid storage space;
a gas outlet in communication with a vapor deposition reactor and an inner gas space defined within the container above the liquid storage space; and
a by-pass conductance route configured to release excess gas pressure from within the inner gas space to the gas inlet, thereby inhibiting liquid flow up the bubbler tube.
20. The system of claim 19 , wherein the by-pass conductance path comprises a plurality of openings in a wall of the bubbler tube, at least some of the openings opening from the bubbler tube to the inner gas space.
21. The system of claim 19 , wherein the bubbler tube comprises a gas flow divider configured to allow vapor phase reactant to pass through while preventing, liquid phase reactant from passing through and wherein the gas flow divider comprises the by-pass conductance route.