Method of manufacturing an IPS LCD device having a light shielding layer under at least one common or data electrodes so that light transmittance areas of the common and data electrodes are the same

1. A method of manufacturing an in-plane switching liquid crystal display device comprising:

preparing the first and second substrates;

forming a plurality of gate lines on the first substrate;

forming an insulation film over a surface of the pixel area including the gate lines;

forming the data lines and light shielding layers each having a predetermined width on the insulation film;

forming a first protective film on the surface including the light shielding layers;

forming a plurality of common electrodes on the first protective film;

forming a second protective film on the surface including the common electrodes;

forming a plurality of data electrodes on the second protective film, the data electrodes and the common electrodes to be alternately formed in each pixel area and having the same light transmitting area; and

forming a liquid crystal layer between the first and second substrates,

wherein each outer most common electrode of the plurality of common electrodes in the unit pixel is substantially vertically aligned with each of the light shielding layers and each of the data electrodes is formed in each area between two adjacent common electrodes.

2. The method of claim 1 , further comprising another light shielding layer under one data electrode, wherein the light shielding layers and another light shielding layer are formed together and same time with the data lines.

3. The method of claim 2 , wherein the light shielding layers are formed of the same material as the data lines.

4. The method of claim 1 , wherein said light shielding layers are formed of the same material as the data lines.

5. A method of manufacturing an in-plane switching liquid crystal display device comprising:

preparing the first substrate;

forming an insulation film over the first substrate including gate lines;

forming light shielding layers having a predetermined width over the first substrate and;

forming a first protective film over the first substrate including the shielding layers;

forming common electrodes on the first protective film;

forming a second protective film on the surface including the common electrodes;

forming a plurality of data electrodes on the second protective film, the data electrodes and the common electrodes to be alternately formed in an unit pixel area, the plurality of data electrodes and common electrodes having the same light transmitting area, and wherein the light shielding layer is formed under outer most ones of the common electrodes and

wherein each outer most common electrode of the plurality of common electrodes in the unit pixel is substantially vertically aligned with each of the shielding layers.

6. The method of claim 5 , further comprising:

forming data lines on the insulation film when the shielding layer is formed;

preparing a second substrate; and

forming a liquid crystal layer between the first and second substrates.

7. The method of claim 5 , further comprising another light shielding layer under one data electrode, wherein the light shielding layers and another light shielding layer are formed together and same time with the data lines.

8. The method of claim 6 , wherein said light shielding layers are formed of the same material as the data lines.

9. The method of claim 5 , wherein each of the data electrodes are deposed between the common electrodes and parallel with the common electrodes.