Method for producing an epitaxially coated semiconductor wafer
View Patent ↗Epitaxially coated semiconductor wafers are prepared by a process in which a semiconductor wafer polished at least on its front side is placed on a susceptor in a single-wafer epitaxy reactor and epitaxially coated on its polished front side at temperatures of 1000-1200° C., wherein, after coating, the semiconductor wafer is cooled in the temperature range from 1200° C. to 900° C. at a rate of less than 5° C. per second. In a second method for producing an epitaxially coated wafer, the wafer is placed on a susceptor in the epitaxy reactor and epitaxially coated on its polished front side at a deposition temperature of 1000-1200° C., and after coating, and while still at the deposition temperature, the wafer is raised for 1-60 seconds to break connections between susceptor and wafer produced by deposited semiconductor material before the wafer is cooled.
1. A method for producing an epitaxially coated semiconductor wafer with reduced stress, comprising placing a semiconductor wafer polished at least on its front side on a susceptor in a single-wafer epitaxy reactor and coating by applying an epitaxial layer on its polished front side by chemical vapor deposition at temperatures of 1000-1200° C., and, after epitaxial coating has taken place, cooling the semiconductor wafer in the temperature range from 1200° C. to 900° C. at a rate of less than 5° C. per second and, after reaching a temperature of 900° C., is cooled at a rate of 5° C. per second or higher.
2. The method of claim 1 , wherein the semiconductor wafer is cooled in a temperature range of 1200-900° C. at a rate of less than or equal to 3° C. per second.
3. The method as claimed in claim 2 , wherein the semiconductor wafer is cooled in the temperature range of 1200-1000° C. at a rate of less than or equal to 1.5° C. per second.
4. The method of claim 1 , wherein the wafer is supported by a silicon carbide ring separate from the susceptor.
5. The method of claim 1 , wherein the wafer is supported on a ring-shaped ledge support in a one-piece susceptor.
6. A method for producing an epitaxially coated semiconductor wafer with reduced stress, comprising placing a semiconductor wafer polished at least on its front side on a susceptor in a single-wafer epitaxy reactor and coating by applying an epitaxial layer on its polished front side by chemical vapor deposition at a deposition temperature of 1000-1200° C., and, after epitaxial coating has taken place, at deposition temperature, raising the semiconductor wafer for 1-60 seconds such that connections between susceptor and wafer that have been produced by deposited semiconductor material are broken up before the wafer is cooled wherein, after epitaxial coating has taken place and after brief raising of the semiconductor wafer, the wafer is cooled in the temperature range from 1200° C. to 900° C. at a rate of less than 5° C. per second.
7. The method as claimed in claim 6 , wherein the semiconductor wafer is cooled in a temperature range of 1200-900° C. at a rate of less than or equal to 3° C. per second.
8. The method of claim 7 , wherein the semiconductor wafer, after reaching a temperature of 900° C., is cooled at a rate of 5° C. per second or higher.
9. The method as claimed in claim 6 , wherein the semiconductor wafer is cooled in the temperature range of 1200-1000° C. at a rate of less than or equal to 1.5° C. per second.
10. The method of claim 9 , wherein the semiconductor wafer, after reaching a temperature of 900° C., is cooled at a rate of 5° C. per second or higher.
11. The method of claim 6 , wherein the semiconductor wafer, after reaching a temperature of 900° C., is cooled at a rate of 5° C. per second or higher.
12. The method of claim 6 , wherein the wafer is supported by a silicon carbide ring separate from the susceptor.
13. The method of claim 6 , wherein the wafer is supported on a ring-shaped ledge support in a one-piece susceptor.