Pattern measurement methods and pattern measurement equipment
View Patent ↗An object of the present invention is to provide methods and equipment capable of providing highly accurate matching using a template including multiple patterns even when the shapes of some patterns of the template are different from corresponding ones of a SEM image, and when the template and the SEM image have a magnification error. Proposed, as a technique for achieving the object, is a method for performing matching by selectively using some of multiple patterns provided in a predetermined region of design data, and equipment for implementing the method. Moreover, proposed, as another technique for achieving the object, is a method for performing first matching by using multiple patterns provided in a predetermined region of design data and thereafter performing second matching by using some of the multiple patterns provided in the predetermined region, and equipment for implementing the method.
1. A pattern matching method comprising:
a step of performing pattern matching on an image produced by a charged particle beam apparatus and a pre-registered template, wherein:
first pattern matching is performed by using a first template including a sub resolution assist feature (SRAF) pattern and a main pattern assisted by the SRAF pattern, or an optical proximity correction (OPC) pattern and a main pattern corrected by the OPC pattern, and,
after a specific region is specified by the first pattern matching, second pattern matching is performed in the specific region by using a second template which does not include the SRAF pattern or the OPC pattern, and which selectively includes the main pattern.
2. Pattern matching equipment comprising:
a controller for performing pattern matching on an image produced by a charged particle beam apparatus and a pre-registered template, wherein
the controller performs first pattern matching by using a first template including a sub resolution assist feature (SRAF) pattern and a main pattern assisted by the SRAF pattern, or an optical proximity correction (OPC) pattern and a main pattern corrected by the OPC pattern, and,
after a specific region is specified by the first pattern matching, the controller performs second pattern matching in the specific region by using a second template which does not include the SRAF pattern or the OPC pattern, and which selectively includes the main pattern.