Lateral bipolar transistor
View Patent ↗A P+ base drawing diffusion region is formed on a substrate having an SOI structure. N+ emitter diffusion regions are formed on both sides of the P+ base drawing diffusion region through isolation insulating films interposed therebetween. A P type SOI layer, which serves as a base diffusion region, is formed so as to surround the N+ emitter diffusion regions, and conductive layers are formed thereon. Further, an N+ collector diffusion region is formed so as to surround the conductive layers.
1. A lateral bipolar transistor formed over a substrate of an SOI structure having a silicon layer provided over an embedded insulating film layer, comprising:
an emitter diffusion region formed in the substrate;
two base diffusion regions formed so as to interpose the emitter diffusion region therebetween;
two collector diffusion regions formed so as to interpose the emitter diffusion region and the two base diffusion regions therebetween;
at least two base drawing diffusion regions formed at positions away from the emitter diffusion region in a state of being respectively electrically connected to the two base diffusion regions; and
an isolation insulating film formed so as to be adjacent to the portion of an emitter diffusion region which is not in contact with the base diffusion regions, and reach the embedded insulating film layer.
2. A lateral bipolar transistor wherein the lateral bipolar transistor according to claim 1 is disposed in parallel in plural form in such a manner that the collector diffusion regions overlap each other.
3. A lateral bipolar transistor wherein the lateral bipolar transistor according to claim 1 is disposed in parallel in plural form in such a manner that the base drawing diffusion regions overlap each other.
4. The lateral bipolar transistor according to claim 2 , further comprising:
an emitter wiring provided in common with all of the emitter diffusion regions arranged in plural form,
a collector wiring provided in common with all of the collector diffusion regions arranged in plural form, and
a base wiring provided in common with all of the base drawing diffusion regions arranged in plural form.