Pattern measuring method and pattern measuring device
View Patent ↗An object of the present invention is to provide a sample measuring method and a sample measuring device suitable for evaluation of inclination of a pattern edge. To achieve the object, a method and a device for forming a plurality of contours of a pattern edge and evaluating the dimension between the contours are proposed below. Forming a plurality of contours allows evaluation of the degree of inclination of an edge portion of a pattern. Further, displaying evaluation values indicative of the degree of the inclination of the edge portion in an in-plane distribution form makes identifying the cause of taper formation easier.
1. A pattern measuring method comprising:
scanning a sample with a charged particle beam to form image data based on charged particles emitted from the sample;
contouring a pattern edge contained in the image data; and
using an imaged contour to measure a pattern formed on the sample, wherein:
the contouring includes, with respect to a band-shaped portion that is in the image data and corresponds to the pattern edge and from which the imaged contour is extracted, forming a first measured contour along positions within the band-shaped portion showing first brightness, and forming a second measured contour along positions within the band-shaped portion showing second brightness, and
the measuring includes measuring a dimension between the two measured contours.
2. The pattern measuring method according to claim 1 ,
wherein information on the dimension between the two measured contours is displayed in a tabular form or in an in-plane distribution form.
3. The pattern measuring method according to claim 1 ,
wherein each of the measured contours is formed based on a waveform representing the brightness distribution of the band-shaped portion that is in the image data and corresponds to the pattern edge and from which the imaged contour is extracted, the distribution being along a direction traversing the band-shaped portion.
4. The pattern measuring method according to claim 3 ,
wherein at least two thresholds are set on the brightness distribution waveform, and the first and second measured contours are formed based on the plurality of thresholds.
5. A pattern measuring device comprising an image processing unit that uses image data formed based on charged particles emitted from a sample to measure a pattern formed on the sample,
wherein the pattern measuring device, with respect to a band-shaped portion that is in the image data and corresponds to a pattern edge and from which an imaged contour is extracted, forms a first measured contour along positions within the band-shaped portion showing first brightness, forms a second measured contour along positions within the band-shaped portion showing second brightness, and measures a dimension between the two measured contours.
6. The pattern measuring device according to claim 5 ,
wherein the image processing unit displays information on the dimension between the two measured contours in a tabular form or in an in-plane distribution form.
7. The pattern measuring device according to claim 5 ,
wherein the image processing unit forms each of the measured contours based on a waveform representing the brightness distribution of the band-shaped portion that is in the image data and corresponds to the pattern edge and from which the imaged contour is extracted, the distribution being along a direction traversing the band-shaped portion.
8. The pattern measuring device according to claim 7 ,
wherein the image processing unit sets at least two thresholds on the brightness distribution waveform and forms the first and second measured contours based on the plurality of thresholds.
9. A measuring system comprising:
a charged particle beam device that irradiates a sample with a charged particle beam to form image data based on charged particles obtained in response to the irradiation; and
a measuring device that is connected to the charged particle beam device via a communication medium and measures a pattern formed on the sample based on the image data,
wherein the measuring device, with respect to a band-shaped portion that is in the image data and corresponds to a pattern edge and from which an imaged contour is extracted, forms a first measured contour along positions within the band-shaped portion showing first brightness, forms a second measured contour along positions within the band-shaped portion showing second brightness, and measures a dimension between the two measured contours for evaluation of inclination of the pattern edge.