Edge detection technique and charged particle radiation equipment
View Patent ↗An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).
1. A computer-implemented method for extracting an edge of a pattern from an image obtained by a charged particle beam apparatus, the method comprising computer-implemented method steps of:
(a) detecting a first edge candidate by specifying a peak position of a profile which is formed by performing projection processing of an image obtained by the charged particle beam apparatus;
(b) detecting a particular pixel, as a second edge candidate, from the image from which the first edge candidate is detected, the particular pixel being detected such that a difference between a pixel value of a first pixel and a pixel value of a second pixel which is different from the first pixel is significant, the first pixel and the second pixel being in a predetermined positional relationship with respect to the particular pixel, respectively; and
(c) extracting a pixel where the first edge candidate and the second edge candidate coincide with each other, as the edge of a pattern.
2. The method according to claim 1 , wherein:
in the statistical filter processing step (b), a nonparametric test is performed in a filter area.
3. The method according to claim 2 , wherein when the nonparametric test is performed, sampling is performed so that two pixels to be compared are positioned in line symmetry with each other.
4. The method according to claim 1 , wherein:
the image subject to edge detection is divided beforehand into a plurality of areas,
an edge position is determined in each of the areas, and
an edge of a line pattern is determined by linear approximation of the determined edge positions.
5. Charged particle beam apparatus comprising:
a charged particle source;
a scanning deflector configured to scan a charged particle beam emitted from the charged particle source; and
an edge detecting section configured to detect a position of an edge from an image obtained by the scan of the scanning deflector, wherein the edge detection section is configured to perform:
(a) detecting a first edge candidate by specifying a peak position of a profile which is formed by performing projection processing of the image obtained by the charged particle beam apparatus;
(b) detecting a particular pixel, as a second edge candidate, from the image from which the first edge candidate is detected, the particular pixel being detected such that a difference between a pixel value of a first pixel and a pixel value of a second pixel which is different from the first pixel is significant, the first pixel and the second pixel being in a redetermined positional relationship with respect to the particular pixel, respectively; and
(c) extracting a pixel where the first edge candidate and the second edge candidate coincide with each other, as the edge of a pattern.
6. The charged particle equipment according to claim 5 , wherein the edge detecting section is further configured so that:
in the statistical filter processing, a nonparametric test is performed in a filter area.
7. The charged particle equipment according to claim 6 , wherein the edge detecting section is further configured so that, when the nonparametric test is performed, sampling is performed so that two pixels to be compared are positioned in line symmetry with each other.
8. The charged particle equipment according to claim 5 , wherein the edge detecting section is further configured so that:
the image is divided beforehand into a plurality of areas,
an edge position is determined in each of the areas, and
an edge of a line pattern is determined by linear approximation of the determined edge positions.