Method for removing moisture from substrate coated with transparent electrode
A method for removing moisture from a substrate coated with a transparent electrode comprises the steps of placing the substrate coated with the transparent electrode in an infrared oven, applying heat to the substrate in the infrared oven, drawing the substrate from the infrared oven, loading the substrate in a chamber and reducing pressure in the chamber and performing a heat treatment on the substrate.
1. A method for removing moisture from a substrate coated with a transparent electrode comprising the steps of:
placing the substrate coated with the transparent electrode in an infrared oven;
applying heat to the substrate in the infrared oven;
drawing the substrate from the infrared oven;
loading the substrate in a chamber; and
reducing pressure in the chamber and performing a heat treatment on the substrate;
wherein it takes a time from 60 seconds to 180 seconds to perform a step of placing the substrate coated with the transparent electrode in an infrared oven; a step of applying heat to the substrate in the infrared oven; and a step of drawing the substrate from the infrared oven, and
wherein it takes a time from 60 seconds to 180 seconds to perform the heat treatment in the chamber.
2. The method according to claim 1 , wherein a temperature in the infrared oven ranges from 120° C. to 200° C.
3. The method according to claim 1 , wherein a temperature in the infrared oven ranges from 150° C. to 200° C.
4. The method according to claim 1 , wherein the pressure in the chamber is reduced to a range from 10 −7 to 10 −3 Torr.
5. The method according to claim 1 , wherein a temperature in the chamber ranges from 150° C. to 200° C.
6. The method according to claim 1 , wherein the transparent electrode comprises one of zinc oxide (ZnO), tin oxide (SnO 2 ), indium zinc oxide (IZO), and indium tin oxide (ITO).
7. The method according to claim 1 , wherein the transparent electrode is scribed by laser.
8. The method according to claim 1 , wherein the substrate is conveyed in the infrared oven by a conveyor.
9. The method according to claim 8 , wherein the conveyor is made by heat resistant materials.
10. A method for removing moisture from a substrate coated with a transparent electrode comprising the steps of:
placing the substrate coated with the transparent electrode in an infrared oven;
applying heat to the substrate in the infrared oven;
drawing the substrate from the infrared oven;
loading the substrate in a chamber;
introducing reaction gas in the chamber;
fixing pressure in the chamber; and
performing a heat treatment on the substrate in the chamber with the reaction gas,
wherein it takes a time from 60 seconds to 180 seconds to perform a step of placing the substrate coated with the transparent electrode in an infrared oven; a step of applying heat to the substrate in the infrared oven; and a step of drawing the substrate from the infrared oven, and
wherein it takes a time from 60 seconds to 180 seconds to perform the heat treatment with the reaction gas.
11. The method according to claim 10 , wherein a temperature in the infrared oven ranges from 150° C. to 200° C.
12. The method according to claim 10 , further comprising reducing the pressure in the chamber after performing the heat treatment on the substrate with the reaction gas.
13. The method according to claim 10 , wherein the pressure in the chamber in which the substrate is loaded ranges from 10 −7 to 10 −3 Torr.
14. The method according to claim 12 , wherein the pressure in the chamber is reduced to a range from 10 −7 to 10 −3 Torr.
15. The method according to claim 10 , wherein the reaction gas is introduced into the chamber at a flow rate from 10 to 500 sccm.
16. The method according to claim 10 , wherein the pressure in the chamber is fixed to a range from 0.3 to 5 Torr.
17. The method according to claim 10 , wherein a temperature in the chamber ranges from 150° C. to 200° C. in the step of performing the heat treatment with the reaction gas.
18. The method according to claim 10 , wherein the reaction gas comprises one selected from the group consisting of nitrogen (N 2 ), argon (Ar), and hydrogen (H 2 ).
19. The method according to claim 10 , wherein the substrate is conveyed in the infrared oven by a conveyor.
20. The method according to claim 19 , wherein the conveyor is made by heat resistant materials.
21. A method for removing moisture from a substrate coated with a transparent electrode for a solar cell, after the substrate with the transparent electrode has been subjected to a wet cleaning process, comprising the steps of:
placing the substrate coated with the transparent electrode in an infrared oven;
applying heat to the substrate in the infrared oven;
drawing the substrate from the infrared oven;
loading the substrate in a chamber; and
reducing pressure in the chamber and performing a heat treatment on the substrate;
wherein it takes a time from 60 seconds to 180 seconds to perform a step of placing the substrate coated with the transparent electrode in an infrared oven; a step of applying heat to the substrate in the infrared oven; and a step of drawing the substrate from the infrared oven, and
wherein it takes a time from 60 seconds to 180 seconds to perform the heat treatment in the chamber.