Antiglare film and manufacturing method thereof
The invention provides an antiglare film. A resin layer is disposed on a substrate. Micro-aggregates are distributed in an interior and over a surface of the resin layer. Each of the micro aggregates has a size of 0.1-3 μm and is formed by aggregating aggregated nano-particles. The micro-aggregates distributing over the surface result in a surface roughness of the resin layer. The weight ratio of the resin layer to the micro-aggregates is 1:0.1-0.7.
1. An antiglare film, comprising:
a substrate;
a resin layer disposed on the substrate;
micro-aggregates uniformly distributed in an interior and over a surface of the resin layer, wherein each of the micro aggregates has a size of 0.1-3 μm and is formed by aggregating silicon-containing nano-particles, and the micro-aggregates distributing over the surface results in a surface roughness of the resin layer;
wherein the weight ratio of the resin layer to the micro-aggregates is 1:0.1-0.7.
2. The antiglare film as claimed in claim 1 , wherein the silicon-containing nano-particles have diameters of 5-80 nm.
3. The antiglare film as claimed in claim 1 , further comprising un-aggregated silicon-containing nano-particles distributed in the interior of the resin layer.
4. The antiglare film as claimed in claim 1 , wherein the substrate comprises plastic substrate or glass substrate.
5. The antiglare film as claimed in claim 1 , wherein the silicon-containing material comprises silicon dioxide, zeolite, or combination thereof.
6. The antiglare film as claimed in claim 1 , wherein the plastic substrate comprises triacetyl cellulose (TAC), polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), polyethylene naphthalate (PEN), or cyclo-olefin copolymer (COC).
7. The antiglare film as claimed in claim 1 , wherein the micro-aggregates are a discontinuous phase and the resin layer is a continuous phase.
8. The antiglare film as claimed in claim 1 , wherein refraction indexes of the micro-aggregates and the resin layer are different, and index differences of the micro-aggregates and the resin layer is 0.01-0.15.
9. The antiglare film as claimed in claim 1 , wherein the resin layer is a light curing resin.
10. The antiglare film as claimed in claim 9 , wherein the light curing resin comprises UV curing resin.
11. The antiglare film as claimed in claim 1 , wherein the resin layer has a thickness of 1-10 μm.
12. A method for manufacturing an antiglare film, comprising:
(a) providing a mixture solution, wherein the mixture solution comprises a resin and silicon-containing nano-particles having diameters of 5-80 nm;
(b) forming a coating solution by stirring the mixture solution for aggregating the silicon-containing nano-particles to form micro-aggregates uniformly distributed in the mixture solution, wherein the coating solution has a solid content of 20-60%, the weight of the silicon-containing nano-particles is about 10-50% of the total weight of the solid content;
(c) coating the coating solution on a substrate;
(d) forming a resin layer having a rough surface by drying the coating solution on the substrate for phase separation of the micro-aggregates; and
(e) curing the resin layer.
13. The method for manufacturing the antiglare film as claimed in claim 12 , wherein the coating method comprises rod coating, blade coating, extrusion coating, gravure coating, or roll coating.
14. The method for manufacturing the antiglare film as claimed in claim 12 , wherein the silicon-containing nano-particles comprise silicon dioxide, zeolite, or combination thereof.
15. The method for manufacturing the antiglare film as claimed in claim 12 , wherein the micro-aggregates have diameters of 0.1-3 μm.
16. The method for manufacturing the antiglare film as claimed in claim 12 , wherein the resin layer is a light curing resin.
17. The method for manufacturing the antiglare film as claimed in claim 16 , wherein the light curing resin comprises UV curing resin.
18. The method for manufacturing the antiglare film as claimed in claim 17 , wherein the UV curing resin is cured by UV light irradiation.
19. The method for manufacturing the antiglare film as claimed in claim 12 , wherein the mixture solution is stirred at a rate of 3500-5000 rpm in the step (b).
20. The method for manufacturing the antiglare film as claimed in claim 19 , wherein the stirring time in the step (b) is 5-40 minutes.
21. The method for manufacturing the antiglare film as claimed in claim 12 , wherein the weight of the silicon-containing nano-particles is preferably about 30-40% of the total weight of the solid content.