Thin-film semiconductor device and method for manufacturing the same

1. A thin-film semiconductor device comprising:

a transparent insulating substrate;

an island silicon layer formed on the transparent insulating substrate and including a source region containing a first-conductivity-type impurity and a drain region containing a first-conductivity-type impurity and spaced apart from the source region;

a gate insulating film and a gate electrode which are formed on a portion of the island silicon layer, which is located between the source region and the drain region;

a crystal-recovering layer formed in a surface of the source region and in a surface of the drain region;

a sidewall spacer having a 3-ply structure including a first oxide film, a nitride film and a second oxide film, which are respectively formed on a sidewall of the gate electrode at a temperature of 500° C. or less;

a stacked source polycrystalline silicon layer formed on the source region and containing the first-conductivity-type impurity and a stacked drain polycrystalline silicon layer formed on the drain region and containing the first-conductivity-type impurity, the stacked source polycrystalline silicon layer and the stacked drain polycrystalline silicon layer being formed by solid-state growth;

high-melting-point metal silicide layers formed on the stacked source polycrystalline silicon layer and the stacked drain polycrystalline silicon layer, the high-melting-point metal being one selected from the group consisting of Ni, Ti, Mo, and W; and

an interlayer insulating film covering the high-melting-point metal silicide layers and the gate electrode, wherein

said source region and said drain region are formed using the sidewall spacer as a mask.

2. The device according to claim 1 , wherein

said stacked source polycrystalline silicon layer is a convex source polycrystalline silicon layer containing the first conductive impurity and buried in a first contact hole formed in the interlayer insulating film and connected with the source region, and said stacked drain polycrystalline silicon layer is a convex drain polycrystalline silicon layer containing the first conductive impurity and buried in a second contact hole formed in the interlayer insulating film and connected with the drain region.

3. The device according to claim 1 , wherein a step between the island crystalline silicon layer and the peripheral region thereof is buried with a first insulating film to form a first flat structure with unevenness confined to 0.1 μm or less; a step generated by the gate electrode is buried with a second insulating film to form a second flat structure with unevenness confined to 0.1 μm or less; first and second contact holes formed in the second insulating film are filled with a contact plug made of a metallic material to form a third flat structure with unevenness confined to 0.1 μm or less; and the source electrode and the drain electrode are buried with the third insulating film to form a fourth flat structure with unevenness confined to 0.1 μm or less, and said source electrode and said drain electrode are connected respectively to the source region and the drain region via the contact plugs.

4. The device according to claim 1 , wherein the sidewall spacer has a width of 0.2 μm.

5. The device according to claim 1 , wherein sidewall spacers having the 3-ply structure are formed on opposing sidewalls of the gate electrode and the stacked source polycrystalline silicon layer and the stacked drain polycrystalline silicon layer are located horizontally adjacent to the sidewall spacers.