IP Library Granted Patent US 7,799,728
Granted Patent B2
US 7,799,728 · App. 12/410,559 · Granted Sep 21, 2010

Photocatalyst dispersing element, method for manufacturing photocatalyst dispersing element, photocatalyst element, method for manufacturing photocatalyst element

Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 7,799,728
App. No.
12/410,559
Granted
Sep 21, 2010
Kind
B2
Abstract

A photocatalyst dispersing element includes: a photocatalyst material; and a solvent. A hydrogen-ion exponent of the solvent is in a range of pH 2.1 or more and pH 5.7 or less. A method for manufacturing a photocatalyst dispersing element includes: adjusting a hydrogen-ion exponent in a solvent to be in a range of inhibiting aggregation of a photocatalyst material and of suppressing lowering of a degree of catalytic activity of the photocatalyst material; and mixing the photocatalyst material with the solvent.

Claims (10)

1. A method for manufacturing a photocatalyst dispersing element, comprising:

adjusting a hydrogen-ion exponent in a solvent by adding a buffer to be in a range of pH 2.1 to 5.7 of inhibiting aggregation of a photocatalyst material and of suppressing lowering of a degree of catalytic activity of the photocatalyst material which is tungsten oxide; and

mixing the photocatalyst material with the solvent.

2. The method according to claim 1 , wherein a binding agent for binding the photocatalyst material is added.

3. The method according to claim 1 , wherein an additive amount of the binding agent is a tenth part or more of a concentration of the photocatalyst material.

4. A method for manufacturing a photocatalyst dispersing element, comprising:

mixing a photocatalyst material with a solvent; and

adjusting a hydrogen-ion exponent in the solvent by adding a buffer to be in a range of pH 2.1 to 5.7 of inhibiting aggregation of the photocatalyst material and of suppressing lowering of a degree of catalytic activity of the photocatalyst material, wherein the photocatalyst material is tungsten oxide.

5. The method according to claim 4 , wherein a binding agent for binding the photocatalyst material is added.

6. The method according to claim 4 , wherein an additive amount of the binding agent is a tenth part or more of a concentration of the photocatalyst material.

Assignments (2)
NUNC PRO TUNC ASSIGNMENT Recorded Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: NITERRA MATERIALS CO., LTD.
Reel/Frame 073843/0532 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 19, 2009
From: YAMABE, JUNSEI; SAKURAI, NAOAKI; MAKINO, NOBUAKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 022849/0540 →
Priority Claims (1)
JP 2008-092497 · Mar 31, 2008 · national
Continuity (1)
Related Publication 20090253575A1 · Oct 8, 2009