IP Library Granted Patent US 8,149,322
Granted Patent B2
US 8,149,322 · App. 12/413,267 · Granted Apr 3, 2012

Image sensor with an improved sensitivity

Assignee: STMicroelectronics S.A.
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Quick Facts
Patent No.
US 8,149,322
App. No.
12/413,267
Granted
Apr 3, 2012
Kind
B2
Abstract

An image sensor having a surface intended to be illuminated and pixels, each pixel including a photosensitive area formed in an active area of the substrate, at least one first pixel including a first microlens located on the surface, the sensor including at least one second pixel including a transparent portion forming a pedestal located at least partly on the surface and a second microlens at least partially covering the pedestal.

Claims (43)

1. An image sensor comprising a surface to be illuminated and pixels, each pixel comprising a photosensitive area formed in an active area of a substrate, each pixel being associated with only one microlens, the microlens of at least one first pixel being located on said surface, the microlens of at least one second pixel at least partially covering a transparent portion forming a pedestal located at least partly on said surface.

2. The image sensor of claim 1 , wherein the pedestal at least partially covers the microlens of a first pixel.

3. The image sensor of claim 1 , wherein the microlens of a second pixel completely covers the pedestal.

4. The image sensor of claim 1 , wherein the second pixel is adjacent to the first pixel, the photosensitive areas of the first and second pixels being offset to the side of the common edge between the first and second pixels.

5. The image sensor of claim 1 , wherein the material of the pedestal has the same optical index as the material of the microlenses.

6. The image sensor of claim 1 , wherein the substrate is covered with a stack of insulating layers, the microlens of a first pixel being located on said stack.

7. The image sensor of claim 1 , comprising at least one third pixel comprising:

an additional transparent portion forming an additional pedestal at least partly located on said surface, thicker than the pedestal; and

a third microlens covering the additional pedestal.

8. An optical device comprising the image sensor of claim 1 .

9. An optical device as defined in claim 8 , comprising a camera, a cell phone, or a digital photographic device.

10. A method for forming an image sensor comprising a surface to be illuminated and pixels, each pixel comprising a photosensitive area formed in an active area of a substrate, comprising:

forming, for at least one first pixel, a first microlens located on said surface;

covering said surface and the first microlens with a transparent layer;

forming in the transparent layer, for at least one second pixel, at least one portion forming a pedestal; and

forming a second microlens at least partially covering the pedestal, wherein each of the first and second pixels is associated with only one microlens.

11. A method as defined in claim 10 , wherein the photosensitive areas of the first and second pixels are offset with respect to centers of the respective first and second pixels.

12. A method as defined in claim 11 , wherein the first and second microlenses are aligned with the offset photosensitive areas of the respective first and second pixels.

13. A method as defined in claim 12 , wherein the pedestal is offset with respect to the center of the second pixel.

14. An image sensor comprising:

a substrate;

first and second pixels, each comprising a photosensitive area, formed in an active area of the substrate;

a first microlens of the first pixel located on an illumination surface of the image sensor;

a transparent pedestal located at least partially on the illumination surface; and

a second microlens of the second pixel at least partially covering the transparent pedestal, wherein each of the first and second pixels is associated with only one microlens.

15. An image sensor as defined in claim 14 , wherein the transparent pedestal is offset with respect to a center of the second pixel.

16. An image sensor as defined in claim 14 , wherein the second microlens completely covers the transparent pedestal.

17. An image sensor as defined in claim 14 , wherein the second pixel is adjacent to the first pixel and the photosensitive areas of the first and second pixels are offset from centers of the respective pixels toward a common edge between the first and second pixels.

18. An image sensor as defined in claim 14 , wherein a material of the transparent pedestal has the same optical index as a material of the first and second microlenses.

19. An image sensor as defined in claim 14 , further comprising a third pixel including an additional transparent pedestal at least partially located on the illumination surface, the additional transparent pedestal being thicker than the transparent pedestal, and a third microlens covering the additional transparent pedestal.

20. An image sensor as defined in claim 14 , wherein the photosensitive areas of the first and second pixels are offset with respect to centers of the respective first and second pixels.

21. An image sensor as defined in claim 20 , wherein the first and second microlenses are aligned with the offset photosensitive areas of the respective first and second pixels.

22. A method for forming an image sensor, comprising:

forming first and second pixels, each comprising a photosensitive area, in an active area of a substrate;

forming a first microlens of the first pixel on an illumination surface of the image sensor;

forming a transparent pedestal at least partially on the illumination surface; and

forming a second microlens of the second pixel at least partially covering the transparent pedestal, wherein each of the first and second pixels is associated with only one microlens.

23. A method as defined in claim 22 , wherein forming a transparent pedestal comprises offsetting the transparent pedestal with respect to a center of the second pixel.

24. A method as defined in claim 22 , wherein the second pixel is formed adjacent to the first pixel, and the photosensitive areas of the first and second pixels are offset from centers of the respective pixels toward a common edge between the first and second pixels.

25. A method as defined in claim 22 , wherein a material of the transparent pedestal has the same optical index as a material of the first and second microlenses.

26. A method as defined in claim 22 , further comprising forming a third pixel, forming an additional transparent pedestal at least partly located on the illumination surface, the additional transparent pedestal being thicker than the transparent pedestal, and forming a third microlens of the third pixel covering the additional transparent pedestal.

27. A method as defined in claim 22 , wherein forming first and second pixels comprises forming the photosensitive areas of the first and second pixels offset with respect to centers of the respective first and second pixels.

28. A method as defined in claim 27 , wherein the first and second microlenses are aligned with the offset photosensitive areas of the respective first and second pixels.

Assignments (2)
CHANGE OF NAME Recorded Jan 21, 2024
From: STMICROELECTRONICS SA
To: STMICROELECTRONICS FRANCE
Reel/Frame 066357/0612 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 9, 2009
From: VAILLANT, JEROME
To: STMICROELECTRONICS S.A.
Reel/Frame 022797/0274 →
Priority Claims (1)
FR 08 52017 · Mar 28, 2008 · national
Continuity (1)
Related Publication 20090244347A1 · Oct 1, 2009