IP Library Granted Patent US 8,796,029
Granted Patent B2
US 8,796,029 · App. 12/415,262 · Granted Aug 5, 2014

System and method for processing target material

Inventors: Won Seok Chung (Hwaseong-si, KR); Kak Namkoong (Seoul, KR); Joonho Kim (Seongnam-si, KR); Kyuyoun Hwang (Yongin-si, KR); Heekyun Lim (Hwaseong-si, KR)
Assignee: Samsung Electronics Co., Ltd.
G01N33/53G01N33/48G01N21/07G01N2035/00495G01N2035/00099G01N2035/00158G01N2035/00148B01L2400/0409
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Quick Facts
Patent No.
US 8,796,029
App. No.
12/415,262
Granted
Aug 5, 2014
Kind
B2
Abstract

A system for processing a target material includes; a cartridge which stores a material which reacts with the target material, and may include at least one chamber and at least one valve connected to the at least one chamber, a first module which may be loaded with the at least one cartridge and may rotate, a second module which may selectively open or close the at least one valve, a third module which may selectively control the temperature of the at least one chamber, and a control module which may control the first module, the second module and the third module.

Claims (45)

1. A system for processing a target material comprising:

a cartridge which stores a material which reacts with the target material, and comprises a lower plate that comprises a substrate having, within the substrate, at least one chamber and at least one valve connected to the at least one chamber and further comprises an upper plate disposed upon the lower plate;

a first module loaded with the cartridge and which rotates; wherein the first module comprises:

a rotor on which the cartridge is mounted;

a motor which rotates the rotor;

a second module which selectively controls the at least one valve;

a third module which selectively controls the temperature of a selected chamber of the at least one chamber, the third module comprising a first transfer unit which includes a temperature regulating block mounted thereon and which moves with respect to the cartridge; and

a control module which controls the first module, second module and third module,

wherein the rotor has a surface on which the cartridge is mounted, and the surface on which the cartridge is mounted is inclined with respect to an axis of rotation of the rotor.

2. The system for processing a target material according to claim 1 , wherein the surface on which the cartridge is mounted is inclined at an angle of about 30 to about 60 degrees with respect to the axis of rotation of the rotor.

3. The system for processing a target material according to claim 1 , wherein the motor alternately changes a direction of rotation of the rotor in clockwise and counter clockwise directions and rotates the rotor.

4. The system for processing a target material according to claim 3 , wherein an angle of rotation of the rotor in each direction is from about 0.1 degree to about 30 degrees.

5. The system for processing a target material according to claim 3 , wherein the motor changes the direction of rotation of the rotor at a frequency of about 1 Hz to about 100 Hz.

6. The system for processing a target material according to claim 1 , wherein the first module further comprises:

an encoder connected to the motor, and which generates a signal corresponding to the rotation of the motor; and

a first controller controlled by the control module, and which controls the motor using the signal generated by the encoder.

7. The system for processing a target material according to claim 1 , wherein the second module comprises:

an electromagnetic wave generator which generates an electromagnetic wave and irradiates the at least one valve with the electromagnetic wave.

8. The system for processing a target material according to claim 7 , wherein the second module further comprises:

a second transfer unit which includes the electromagnetic wave generator mounted thereon and which moves with respect to the cartridge; and

a second controller which is controlled by the control module, and controls the electromagnetic wave generator and the second transfer unit.

9. The system for processing a target material according to claim 1 , wherein the third module further comprises:

a sensor which measures the temperature of the temperature regulating block; and

a third controller which is controlled by the control module, and controls the temperature of the temperature regulating block depending on the temperature measured by the sensor.

10. The system for processing a target material according to claim 1 , further comprising:

a fourth module which takes photographs of the cartridge and transfers the photographs to the control module.

11. The system for processing a target material according to claim 1 , further comprising:

a fifth module which controls the temperature of substantially the whole cartridge and is controlled by the control module.

12. The system for processing a target material according to claim 1 , further comprising:

a sixth module which measures the concentration of the target material in the cartridge in an optical manner.

13. The system for processing a target material according to claim 1 , wherein the target material includes nucleic acid.

14. The system for processing a target material according to claim 1 , wherein the cartridge includes a plurality of chambers and a plurality of valves disposed between the plurality of chambers.

15. A method for processing a target material comprising:

injecting a material which reacts with the target material in a cartridge comprising a lower plate that comprises a substrate having, within the substrate, at least one chamber and at least one valve connected to the at least one chamber and further comprising an upper plate disposed upon the lower plate;

loading the cartridge onto a rotor that rotates the cartridge;

injecting a sample including the target material into the cartridge;

rotating the cartridge;

selectively controlling the at least one valve connected to the at least one chamber to transfer the target material from the at least one chamber; and

selectively controlling the temperature of a selected chamber of the at least one chamber by moving a temperature regulating block with respect to the cartridge,

wherein the rotor has a surface on which the cartridge is mounted, and the surface on which the cartridge is mounted is inclined with respect to an axis of rotation of the rotor.

16. The method for processing a target material according to claim 15 , further comprising:

controlling the temperature of substantially the whole cartridge.

17. The method for processing a target material according to claim 15 , wherein the selectively controlling the at least one valve comprises:

irradiating the valve with an electromagnetic wave.

18. The method for processing a target material according to claim 15 , wherein the target material includes nucleic acid.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 1, 2009
From: CHUNG, WON SEOK; NAMKOONG, KAK; KIM, JOONHO; HWANG, KYUYOUN; LIM, HEEKYUN
To: SAMSUNG ELECTRONICS, CO., LTD.
Reel/Frame 022480/0754 →
Priority Claims (1)
KR 10-2008-0119079 · Nov 27, 2008 · national
Continuity (1)
Related Publication 20100130732A1 · May 27, 2010