Method of performing mask-writer tuning and optimization
View Patent ↗A model-based tuning method for tuning a first mask writer unit utilizing a reference mask writer unit, each of which has tunable parameters for controlling mask writing performance. The method includes the steps of defining a test pattern and a mask writing model; generating the test pattern utilizing the reference mask writer unit and measuring the mask writing results; generating the test pattern utilizing the first mask writer unit and measuring the mask writing results; calibrating the mask writing model utilizing the mask writing results corresponding to the reference mask writer unit, where the calibrated mask writing model has a first set of parameter values; tuning the calibrated mask writing model utilizing the mask writing results corresponding to the first mask writer unit, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first mask writer unit based on a difference between the first set of parameter values and the second set of parameter values.
1. A method of tuning a first mask writer unit utilizing a reference mask writer unit, said first mask writer unit and said reference mask writer unit each having tunable parameters for controlling mask writing performance, said method comprising steps of:
defining a test pattern and a mask writing model;
generating said test pattern utilizing said reference mask writer unit and measuring mask writing results;
generating said test pattern utilizing said first mask writer unit and measuring mask writing results;
calibrating said mask writing model utilizing said mask writing results corresponding to said reference mask writer unit, said calibrated mask writing model having a first set of parameter values;
tuning said calibrated mask writing model utilizing said mask writing results corresponding to said first mask writer unit, said tuned calibrated mask writing model having a second set of parameter values; and
adjusting said tunable parameters of said first mask writer unit based on a difference between said first set of parameter values and said second set of parameter values.
2. The method of claim 1 , wherein said first mask writer unit comprises at least one of an e-beam writer unit and an optical writer unit.
3. The method of claim 1 , wherein said mask writing model comprises fixed parameters.
4. The method of claim 1 , wherein said tunable parameters of said first mask writer unit correspond to said tunable parameters of said reference mask writer unit.
5. The method of claim 1 , wherein said tunable parameters of said first mask writer unit and said reference mask writer unit are set at a nominal value when generating said test pattern.
6. A method of tuning a mask writer unit utilizing a mask writing model, said mask writer unit and said mask writing model each having tunable parameters for controlling mask writing performance, said method comprising steps of:
defining a test pattern;
generating said test pattern utilizing said mask writer unit and measuring mask writing results, said mask writer unit having a first set of parameter values;
tuning said mask writing model utilizing said mask writing results corresponding to said mask writer unit, said tuned mask writing model having a second set of parameter values; and
adjusting said tunable parameters of said mask writer unit based on a difference between said first set of parameter values and said second set of parameter values.
7. The method of claim 6 , wherein said mask writer unit comprises at least one of an e-beam writer unit and an optical writer unit.
8. The method of claim 6 , wherein said mask writing model further comprises fixed parameters.
9. The method of claim 6 , wherein said tunable parameters of said mask writer unit correspond to said tunable parameters of said mask writing model.
10. The method of claim 6 , wherein said tunable parameters of said mask writer unit are set at a nominal value when generating said test pattern.