Patent Assignment
Reel/Frame 024278/0346
Assignment of Assignor's Interest
Recorded: 2010-04-23
Pages: 9
Assignor
BRION TECHNOLOGIES, INC.
Executed: 2010-04-16
Assignee
ASML NETHERLANDS B.V.
DE RUN 6501, VELDHOVEN, NL-5504 DR, NETHERLANDS
Covered Properties
(77)
Model-Based Process Simulation Systems and Methods
PCT:
PCT/US2009/045726 ↗
Model-Based Scanner Tuning Systems and Methods
PCT:
PCT/US2009/045729 ↗
Lens Heating Compensation Systems and Methods
PCT:
PCT/US2009/045732 ↗
Illumination Optimization
PCT:
PCT/US2009/049792 ↗
Methods and Systems for Parameter-Sensitive and Orthogonal Gauge Design for Lithography Calibration
PCT:
PCT/US2009/063798 ↗
Fast Freeform Source and Mask Co-Optimization Method
PCT:
PCT/US2009/065359 ↗
System and Method for Aerial Image Sensing
System and Method for Lithography Process Monitoring and Control
System and Method for Lithography Process Monitoring and Control
Patent:
6,806,456 →
Application:
10/646,313 →
Method and Apparatus for Monitoring Integrated Circuit Fabrication
System and Method for Lithography Process Monitoring and Control
System and Method for Lithography Process Monitoring and Control
Method and Apparatus for Monitoring Integrated Circuit Fabrication
Method and Apparatus for Monitoring Integrated Circuit Fabrication
Method and Apparatus for Monitoring Integrated Circuit Fabrication
System and Method for Lithography Simulation
Method and Apparatus for Synchronizing Data Acquisition of a Monitored Ic Fabrication Process
System and Method for Lithography Process Monitoring and Control
System and Method for Lithography Process Monitoring and Control
Method and Apparatus for Monitoring Integrated Circuit Fabrication
System and Method for Detecting Integrated Circuit Pattern Defects
Patent:
7,558,419 →
Application:
10/917,060 →
System and Method for Lithography Simulation
System and Method for Lithography Simulation
System and Method for Lithography Simulation
System and Method for Lithography Simulation
Method and Apparatus for Monitoring Integrated Circuit Fabrication
System and Method for Lithography Simulation
System and Method for Lithography Process Monitoring and Control
System and Method for Characterizing Aerial Image Quality in a Lithography System
Method for Detecting, Sampling, Analyzing, and Correcting Marginal Patterns in Integrated Circuit Manufacturing
Method for Lithography Model Calibration
System and Method for Creating a Focus-Exposure Model of a Lithography Process
System and Method for Measuring and Analyzing Lithographic Parameters and Determining Optimal Process Corrections
Method for Identifying and Using Process Window Signature Patterns for Lithography Process Control
System and Method for Lithography Simulation
System and Method for Mask Verification Using an Individual Mask Error Model
Method for Selecting and Optimizing Exposure Tool Using an Individual Mask Error Model
Method for Process Window Optimized Optical Proximity Correction
Patent:
7,694,267 →
Application:
11/670,848 →
System and Method for Model-Based Sub-Resolution Assist Feature Generation
Multivariable Solver for Optical Proximity Correction
Three-Dimensional Mask Model for Photolithography Simulation
Patent:
7,703,069 →
Application:
11/838,582 →
Method of Performing Model-Based Scanner Tuning
Method for Performing Pattern Decomposition for a Full Chip Design
Methods and System for Lithography Process Window Simulation
Method of Performing Mask-Writer Tuning and Optimization
Lens Heating Compensation Systems and Methods
Model-Based Scanner Tuning Systems and Methods
Model-Based Process Simulation Systems and Methods
Method, Program Product and Apparatus for Performing a Model Based Coloring Process for Geometry Decomposition for Use in a Multiple Exposure Process
Lithographic Processing Method, and Device Manufactured Thereby
Scanner Model Representation with Transmission Cross Coefficients
Methods and System for Lithography Calibration
Pattern Selection for Lithographic Model Calibration
Methods and System for Model-Based Generic Matching and Tuning
Delta Tcc for Fast Sensitivity Model Computation
Smart Selection and/or Weighting of Parameters for Lithographic Process Simulation
Harmonic Resist Model for Use in a Lithographic Apparatus and a Device Manufacturing Method
Method and System for Lithography Process-Window-Maximixing Optical Proximity Correction
Local Multivariable Solver for Optical Proximity Correction in Lithographic Processing Method, and Device Manufactured Thereby
Process Window Signature Patterns for Lithography Process Control
Methods for Performing Model-Based Lithography Guided Layout Design
Method for Process Window Optimized Optical Proximity Correction
Multivariable Solver for Optical Proximity Correction
Three-Dimensional Mask Model for Photolithography Simulation
Lens Heating Aware Opc Systems and Methods
Application:
61/058,502 →
Model-Based Scanner Tuning Systems and Methods
Application:
61/058,511 →
Model-Based Scanner Simulation Systems and Methods
Application:
61/058,520 →
Method and System for Lithography Illuminator Optimization
Application:
61/078,599 →
Methods and System for Gauge Design for Lithography Calibration
Application:
61/113,004 →
Fast Freeform Source and Mask Co-Optimization Method
Application:
61/116,788 →
Lens Heating Compensation Systems and Methods
Application:
61/122,537 →
Pattern Selection for Lithographic Model Calibration
Application:
61/140,812 →
Model-Based Scanner Simulation Systems and Methods
Application:
61/141,578 →
Model-Based Scanner Tuning Systems and Methods
Application:
61/142,305 →
Determining the Gradient and Hessian of the Ils
Application:
61/222,883 →
Pattern Selection for Full Chip Source Mask Optimization (Smo)
Application:
61/255,738 →
Method and Apparatus for Enhancing Signal Strength for Improved Generation and Placement of Model-Based Sub-Resolution Assist Features (Mb-Sraf)
Application:
61/295,100 →
Related Assignments
(14)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Apr 7, 2003
From: YE, JUN; PEASE, R. FABIAN W.; CHEN, XUN
To: BRION TECHNOLOGIES, INC.
Reel/Frame 013920/0847 →
Assignment of Assignor's Interest
Nov 7, 2003
From: YE, JUN
To: BRION TECHNOLOGIES, INC.
Reel/Frame 014679/0653 →
Assignment of Assignor's Interest
Feb 23, 2004
From: YE, JUN; CHEN, XUN
To: BRION TECHNOLOGIES, INC.
Reel/Frame 014995/0641 →
Assignment of Assignor's Interest
Jun 28, 2004
From: CHEN, XUN
To: BRION TECHNOLOGIES, INC.
Reel/Frame 015506/0615 →
Assignment of Assignor's Interest
Jun 28, 2004
From: CAO, YU
To: BRION TECHNOLOGIES, INC.
Reel/Frame 015507/0822 →
Assignment of Assignor's Interest
Jun 28, 2004
From: YE, JUN
To: BRION TECHNOLOGIES, INC.
Reel/Frame 015507/0845 →
Assignment of Assignor's Interest
Jun 28, 2004
From: CHEN, LUOQI
To: BRION TECHNOLOGIES, INC.
Reel/Frame 015507/0851 →
Assignment of Assignor's Interest
Jun 28, 2004
From: LU, YEN-WEN
To: BRION TECHNOLOGIES, INC.
Reel/Frame 015510/0325 →
Assignment of Assignor's Interest
Aug 3, 2004
From: GASSNER, MICHAEL J.
To: BRION TECHNOLOGIES, INC.
Reel/Frame 015632/0873 →
Assignment of Assignor's Interest
Oct 25, 2004
From: YE, JUN
To: BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIR UNIVERSITY, THE
Reel/Frame 015912/0920 →
Assignment of Assignor's Interest
Oct 25, 2004
From: PEASE, R. FABIAN
To: BOARD OF TRUSTEED OF THE LELAND STANFORD JUNIOR UNIVERSITY, THE
Reel/Frame 015912/0963 →
Assignment of Assignor's Interest
Oct 25, 2004
From: CAO, YU
To: BRION TECHNOLOGIES, INC.
Reel/Frame 015912/0923 →
Assignment of Assignor's Interest
Nov 19, 2004
From: PEASE, R. FABIAN W.
To: BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY, THE
Reel/Frame 015998/0837 →
Confirmatory License
Jan 16, 2007
From: STANFORD UNIVERSITY
To: SECRETARY OF THE UNITED STATES NAVY OFFIC EOF NAVAL RESERACH
Reel/Frame 018766/0949 →