Semiconductor light emitting device including substrate having protection layers and method for manufacturing the same

1. A semiconductor light emitting device comprising:

an Si—Al substrate;

first and second protection layers formed on top and bottom surfaces of the Si—Al substrate, the first and second protection layers being formed of metal or conductive dielectric to protect the Si—Al substrate from chemical damage; and

a p-type semiconductor layer, an active layer, and an n-type semiconductor layer which are sequentially stacked on the first protection layer formed on the top surface of the Si—Al substrate,

wherein the first and second protection layers are formed to have a same thickness.

2. The semiconductor light emitting device of claim 1 , wherein the metal is formed of any one selected from a group consisting of Ni, Au, Cu, W, Cr, Mo, Pt, Ru, Rh, Ti, and Ta, or an alloy of two or more selected from the group.

3. The semiconductor light emitting device of claim 1 , wherein the conductive dielectric is formed of any one selected from a group consisting of ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), and CIO (Copper Indium Oxide).

4. The semiconductor light emitting device of claim 1 , wherein the first and second protection layer are formed to have a thickness of 0.01 μm or more and 20 μm or less.

5. The semiconductor light emitting device of claim 1 , further comprising:

a bonding metal layer formed between the first protection layer formed on the top surface of the Si—Al substrate and the p-type semiconductor layer,

wherein the first protection layer is different from the bonding metal layer in terms of material.

6. The semiconductor light emitting device of claim 5 , further comprising:

a reflective metal layer formed between the bonding metal layer and the p-type semiconductor layer.