Laser irradiation apparatus and method of fabricating organic light emitting display using the same
Provided are a laser irradiation apparatus and method of fabricating an organic light emitting display using the same. The laser irradiation apparatus includes a mask positioned below the laser generator, and the mask is patterned such that lengths of an upper portion and a lower portion of a mask pattern are patterned longer than a length of a middle portion of the mask pattern with respect to the scanning direction. The method of fabricating an organic light emitting display includes scanning a laser beam on a predetermined region of the donor substrate using the laser irradiation apparatus to form an organic layer pattern on the substrate. When the organic layer pattern is formed using a laser induced thermal imaging (LITI) method, the transfer may be carried out using a laser beam having low energy, laser beam efficiency may be enhanced, the organic layer may be less damaged, and the quality of the organic layer pattern to be transferred may also be enhanced.
1. A method of fabricating an organic light emitting display, comprising:
providing a substrate where a pixel electrode is formed;
laminating a donor substrate on an entire surface of the substrate; and
scanning a laser beam on a predetermined region of the donor substrate using a laser generator and a mask positioned below the laser generator to form an organic layer pattern on the substrate,
wherein lengths of an upper portion and a lower portion of the mask are patterned longer than a length of a middle portion of the mask pattern with respect to a scanning direction.
2. The method as recited in claim 1 , wherein the mask pattern has a I shape.
3. The method as recited in claim 1 , wherein the mask pattern is shaped such that at least one side of the mask pattern is opened.
4. The method as recited in claim 3 , wherein the mask pattern is formed to have any one shape of , , and .
5. The method as recited in claim 1 , wherein the mask is patterned except a center of the middle portion of the mask pattern.
6. The method as recited in claim 1 , wherein forming the organic layer pattern on the pixel electrode is carried out in a nitride (N 2 ) atmosphere.
7. The method as recited in claim 1 , wherein forming the organic layer pattern on the pixel electrode is carried out in a vacuum atmosphere.
8. The method as recited in claim 1 , wherein the organic layer pattern is a single layer or a multi-layer of at least two layers selected from a group consisting of an emission layer, a hole injection layer, a hole transport layer, an electron transport layer and an electron injection layer.