Substrate processing apparatus and substrate processing method
View Patent ↗A substrate processing apparatus and a substrate processing method, with which a resist can be removed satisfactorily from the substrate and a processing solution used for removing the resist can be recycled, are provided. The substrate processing apparatus includes: a substrate holding means holding a substrate; a peroxosulfuric acid generating means generating a peroxosulfuric acid using sulfuric acid; a mixing means mixing the peroxosulfuric acid generated by the peroxosulfuric acid generating means and sulfuric acid of higher temperature and higher concentration than the sulfuric acid used in the peroxosulfuric acid generating means; and a discharging means discharging, toward the substrate held by the substrate holding means, the mixed solution of the peroxosulfuric acid and the sulfuric acid mixed by the mixing means as a processing solution for removing a resist from the substrate.
1. A substrate processing method comprising:
a peroxosulfuric acid generating step of generating a peroxosulfuric acid by using sulfuric acid; and
a supplying step of mixing the peroxosulfuric acid generated in the peroxosulfuric acid generating step and sulfuric acid of higher temperature and higher concentration than the sulfuric acid used in the peroxosulfuric acid generating step to form a mixed solution, and, immediately after mixing, supplying the mixed solution to a substrate as a processing solution for removing a resist from the substrate.
2. The substrate processing method according to claim 1 , wherein the sulfuric acid used in the peroxosulfuric acid generating step has a concentration of 2 to 11 mol/l.
3. The substrate processing method according to claim 1 , wherein, in the supplying step, a concentration of the peroxosulfuric acid in the mixed solution is 10 to 150 g/l.