Electronic device having a plastic substrate

1. A method of manufacturing a thin-film electronic device, the method comprising:

applying a fluorinated plastic coating to a rigid carrier substrate using a wet casting process, the rigid carrier substrate being in a substrate plane, and the plastic coating forming a plastic substrate, wherein fluorination provides improved transparency of the coating;

aligning the transparent plastic material on the rigid carrier substrate so that a coefficient of thermal expansion (CTE) of the transparent plastic material is at least three times greater in a first direction perpendicular to the substrate plane than in a second direction parallel to the substrate plane, wherein the CTE of the transparent plastic material parallel to the substrate is matched to a CTE of the rigid carrier substrate;

forming a plurality of thin film electronic elements over the plastic substrate; and

releasing the rigid carrier substrate from the plastic substrate, by a heating process which expands the plastic substrate in a direction perpendicular to the substrate plane.

2. The method as claimed in claim 1 , wherein the plastic material has a greatest coefficient of thermal expansion in a direction substantially perpendicular to the rigid carrier substrate.

3. The method as claimed in claim 1 , wherein the plastic material has a less coefficient of thermal expansion in a direction substantially parallel to the rigid carrier substrate.

4. The method as claimed in claim 1 , wherein the coefficient of thermal expansion of the plastic material perpendicular to the rigid carrier substrate is at least five times that parallel to the rigid carrier substrate.

5. The method as claimed in claim 4 , wherein the coefficient of thermal expansion of the plastic material perpendicular to the rigid carrier substrate is at least then times that parallel to the rigid carrier substrate.

6. The method as claimed in claim 1 , wherein the coefficient of thermal expansion of the plastic material parallel to the rigid carrier substrate is less than 30×10 −6 /° C.

7. The method as claimed in claim 1 , wherein the plastic material comprises a polyimide.

8. The method as claimed in claim 7 , wherein the plastic material comprises poly(p-phenylene biphenyltetracarboximide).

9. The method as claimed in claim 1 , wherein the release is by thermally delaminating the plastic substrate from the rigid carrier substrate.

10. The method as claimed in claim 9 , wherein the thermal delamination is performed by exposure to ultraviolet laser light.

11. The method as claimed in claim 10 , wherein the ultraviolet laser light has a wavelength greater than 200 nm.

12. The method as claimed in claim 1 , wherein the rigid carrier substrate comprises a glass substrate.

13. The method as claimed in claim 1 , wherein the wet casting process comprises a spin-on process.

14. The method as claimed in claim 1 :

forming the plurality of thin film electronic elements over the plastic substrate comprises forming an array of pixel circuits over the plastic substrate, and

forming a display layer over the array of pixel circuits before releasing the rigid carrier substrate from the plastic substrate.

15. The method as claimed in claim 14 , further comprising manufacturing a second substrate arrangement, and wherein forming a display layer over the array of pixel circuits comprises mounting the first and second substrate arrangements with electro-optic material sandwiched therebetween, the active matrix display device thereby comprising first and second substrates with the electro-optic material sandwiched therebetween.

16. A thin-film electronic device comprising:

a fluorinated, transparent, plastic substrate with a plurality of thin film electronic elements formed on a surface, the plastic substrate formed by:

coating a surface of a rigid carrier substrate with a fluoridated, transparent, plastic material using a wet casting process, wherein the fluorination provides improved transparency of the coating;

aligning the transparent plastic material on the rigid carrier substrate so that a coefficient of thermal expansion (CTE) of the transparent plastic material is at least three times greater in a first direction perpendicular to the substrate plane than in a second direction parallel to the substrate plane, wherein the CTE of the transparent plastic material parallel to the substrate is matched to a CTE of the rigid carrier substrate;

forming a plurality of thin film electronic elements over the plastic substrate; and

releasing the rigid carrier substrate from the plastic substrate, by a heating process which expands the plastic substrate in a direction perpendicular to the substrate plane.

17. A system for manufacturing a thin-film electronic device, the system comprising:

a wet caster configured for applying a fluorinated, transparent, plastic coating to a rigid carrier substrate using a wet casting process, the rigid carrier substrate being in a substrate plane, and the plastic coating forming a plastic substrate, wherein fluorination provides improved transparency of the coating;

an aligner configured for aligning the transparent plastic material on the rigid carrier substrate so that a coefficient of thermal expansion (CTE) of the transparent plastic material is at least three times greater in a first direction perpendicular to the substrate plane than in a second direction parallel to the substrate plane, wherein the CTE of the transparent plastic material parallel to the substrate is matched to a CTE of the rigid carrier substrate;

a thin film element former configured for forming a plurality of thin film electronic elements over the plastic substrate; and

a heated substrate releaser configured for releasing the rigid carrier substrate from the plastic substrate, using a heating process which expands the plastic substrate in a direction perpendicular to the substrate plane.