Propanoates and processes for preparing the same
View Patent ↗A process for preparing proponates which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) replacing the methanol in said ether containing solution with a second solvent and (iv) reacting the ether containing ethyl lactate solution with a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form said propanoates. New compositions of matter which comprise the propanoates, prepared in the above manner, have application in the electronic chemicals market such as in a photoresist composition.
1. A process for preparing a propanoate selected from the group consisting of (a) ethyl (2S)-2-[(1S)-1-(4-hydroxyphenyl)ethoxy]propanoate, (b) ethyl (2S)-2-[(1R)-1-(4-hydroxyphenyl)ethoxy]propanoate, and (c) mixtures of (a) and (b), which comprises the steps of (a) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (b) contacting said solution with an acid ion exchange resin for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (c) replacing the methanol in said ether containing solution with a second solvent, and (d) reacting the ether containing ethyl lactate solution with a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form said propanoate.
2. The process as set forth in claim 1 wherein said acid catalyst is a Lewis acid.
3. The process as set forth in claim 1 wherein the temperature in steps (b) and (d) is from about 0° C. to about 120° C.
4. The process as set forth in claim 1 wherein the acid catalyst is a mineral acid.
5. The process as set forth in claim 4 wherein the acid catalyst is sulfuric acid.
6. The process as set forth in claim 1 wherein the acid catalyst is selected from the group consisting of H 2 SO 4 , HCL, H 3 PO 4 , para-toluene sulfonic acid, methane sulfonic acid, trifluoroacetic acid, trichloroacetic acid and mixtures thereof.
7. The process as set forth in claim 1 wherein the acid catalyst is paratoluene sulfonic acid.
8. A composition of matter having the following structure:
9. A composition of matter having the following structure:
10. A composition of matter comprising a mixture of the structures set forth in claims 8 and 9 .
11. A composition of matter selected from the group consisting of
(a) ethyl (2S)-2-[(1S)-1-(4-hydroxyphenyl)ethoxy]propanoate,
(b) ethyl (2S)-2-[(1R)-1-(4-hydroxyphenyl)ethoxy]propanoate, and
(c) mixtures of (a) and (b).
12. A primary photoresist composition for patterning electronic circuitry containing as an additive the composition of matter set forth in claim 11 .
13. A photoresist composition comprising a styrenic polymer, an acrylate polymer and a propanoate selected from the group consisting of
(a) ethyl (2S)-2-[(1S)-1-(4-hydroxyphenyl)ethoxy]propanoate,
(b) ethyl (2S)-2-[(1R)-1-(4-hydroxyphenyl)ethoxy]propanoate, and
(c) mixtures of (a) and (b).
14. The photoresist composition as set forth in claim 13 wherein the propanoate is present in an amount less than about 5 percent by weight based on the total weight of the polymers therein.