IP Library Granted Patent US 8,101,519
Granted Patent B2
US 8,101,519 · App. 12/476,737 · Granted Jan 24, 2012

Mold, manufacturing method of mold, method for forming patterns using mold, and display substrate and display device manufactured by using method for forming patterns

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Quick Facts
Patent No.
US 8,101,519
App. No.
12/476,737
Granted
Jan 24, 2012
Kind
B2
Abstract

The present invention relates to a mold, a manufacturing method of the mold, and a method of forming patterns using the mold. The mold may include a main body having a convex portion and a recess portion, and a polymer layer formed over the main body by processing a surface of the main body with a high molecular weight material through a surface treatment.

Claims (52)

1. A mold, comprising:

a main body having a convex portion and a recess portion; and

a polymer layer disposed on the convex portion and the recess portion, the polymer layer having an amine group,

wherein the polymer layer comprises a dimethylsiloxane and aminopropyl methylsiloxane copolymer (PDMS-co-APMS).

2. The mold of claim 1 , wherein the polymer layer is formed by combining the amine group and N-hydrosuccinimide esters.

3. The mold of claim 1 , wherein the polymer layer has a hydrophobic property at a surface of the polymer layer.

4. The mold of claim 3 , wherein a contact angle of a surface of the polymer layer is about 95° to 110°.

5. A mold, comprising:

a main body having a convex portion and a recess portion; and

a polymer layer on the main body, the polymer layer having a hydrophobic property,

wherein the polymer layer comprises a polymer/copolymer.

6. The mold of claim 5 , wherein a contact angle of a surface of the polymer layer is about 95° to 110°.

7. The mold of claim 5 , wherein the polymer/copolymer comprises a dimethylsiloxane and aminopropyl methylsiloxane copolymer (PDMS-co-APMS).

8. A method of forming a mold, comprising:

forming a main body having a convex portion and a recess portion; and

processing a surface of the main body with a high molecular weight material comprising an amine group.

9. The method of claim 8 , wherein processing the surface of the main body with the high molecular weight material comprising the amine group comprises:

forming a hydrophilic group on the surface of the main body;

replacing the hydrophilic group with N-hydrosuccinimide esters; and

reacting the N-hydrosuccinimide esters with the amine group of the high molecular weight material.

10. The method of claim 9 , wherein the hydrophilic group is at least one selected from a carboxyl group and a hydroxyl group.

11. The method of claim 10 , wherein, in forming the hydrophilic group on the surface of the main body,

the surface of the main body is processed through ozone treatment or with ultraviolet rays.

12. The method of claim 11 , wherein a contact angle of the surface of the main body having the hydrophilic property is about 25° to 35°.

13. The method of claim 11 , wherein the ozone treatment is performed for about 10 minutes to 60 minutes.

14. The method of claim 9 , wherein, in replacing the hydrophilic group with N-hydrosuccinimide esters,

the carboxyl group reacts with a mixture of 1-[3-(dimethylamino)propyl]-3-ethyl carboimide hydrochloride (EDC) and N-hydrosuccinimide (NHS).

15. The method of claim 14 , wherein the mixture contains the EDC and NHS in a mole ratio of 2:1.

16. The method of claim 9 , wherein reacting the N-hydrosuccinimide esters with the amine group of the high molecular weight material is performed for about 1 hour to 4 hours at a temperature about 80° C. to 130° C.

17. A method of manufacturing a mold, comprising:

forming a main body comprising a convex portion and a recess portion; and

forming a polymer layer having a hydrophobic property on the main body,

wherein the polymer layer comprises a polymer/copolymer having an amine group.

18. The method of claim 17 , wherein forming the polymer layer comprises:

forming a hydrophilic group on a surface of the main body;

replacing the hydrophilic group with N-hydrosuccinimide esters; and

reacting the N-hydrosuccinimide esters with the polymer/copolymer.

19. The method of claim 17 , wherein the polymer/copolymer comprises a dimethylsiloxane and aminopropyl methylsiloxane copolymer (PDMS-co-APMS).

20. A method of forming a pattern, comprising:

coating a pattern forming region on a substrate;

forming a resist layer on the pattern forming region;

forming a main body of a mold, the main body having a convex portion and a recess portion;

performing surface treatment on a surface of the main body having the convex portion and the recess portion, the surface treatment being performed with a high molecular weight material having an amine group, the surface treatment imparting a hydrophobic property to the surface of the main body;

disposing the mold over the resist layer;

forming a pre-resist pattern having a non-pattern portion and a pattern portion by imprinting the resist layer using the mold;

forming a hardened resist pattern by exposing the imprinted pre-resist pattern;

separating the mold from the hardened resist pattern;

forming a resist pattern by removing the non-pattern portion by ashing the hardened resist pattern;

performing heat treatment on the resist pattern;

forming a pattern at the pattern forming region by etching the resist pattern; and

stripping the resist pattern.

21. The method of claim 20 , wherein the high molecular weight material comprises a dimethylsiloxane and aminopropyl methylsiloxane copolymer (PDMS-co-APMS).

Assignments (2)
CHANGE OF NAME Recorded Aug 28, 2012
From: SAMSUNG ELECTRONICS CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 028863/0810 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 4, 2009
From: LEE, SEUNG-JUN
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 022778/0406 →