Light emitting diode having barrier layer of superlattice structure
View Patent ↗A light emitting diode (LED) having a barrier layer with a superlattice structure is disclosed. In an LED having an active region between an GaN-based N-type compound semiconductor layer and a GaN-based P-type compound semiconductor layer, the active region comprises a well layer and a barrier layer with a superlattice structure. As the barrier layer with the superlattice structure is employed, it is possible to reduce occurrence of defects caused by lattice mismatch between the well layer and the barrier layer.
1. A light emitting diode (LED) comprising an active region between a GaN-based N-type compound semiconductor layer and a GaN-based P-type compound semiconductor layer,
wherein the active region comprises a well layer and a barrier layer, the barrier layer having a superlattice structure,
wherein the well layer comprises InGaN, the barrier layer comprises the superlattice structure in which InGaN and GaN are alternately laminated, and InGaN in the well layer contains a larger amount of In than InGaN in the barrier layer, and
wherein the well layer comprises In x Ga (1-x) N, and the barrier layer comprises a lower superlattice having In y Ga (1-y) N and GaN alternately laminated, an upper superlattice having In y Ga (1-y) N and GaN alternately laminated, and a middle superlattice interposed between the lower superlattice and the upper superlattice, the middle superlattice having In z Ga (1-z )N and GaN alternately laminated, where 0<x<1, 0<y<0.05, 0<z<0.1 and y<z<x.
2. The LED of claim 1 , wherein each of the In y Ga (1-y) N, GaN, and In z Ga (1-z) N in the barrier layer has a thickness in a range from 2.5 to 20 Å.
3. The LED of claim 1 , wherein the lower superlattice has In y Ga (1-y) N and GaN alternately laminated 4 to 10 times, the middle superlattice has In z Ga (1-z) N and GaN alternately laminated 6 to 20 times, and the upper superlattice has In y Ga (1-y) N and GaN alternately laminated 4 to 10 times.
4. The LED of claim 1 , wherein the active region comprises a multiple quantum well structure in which the well layer and the barrier layer with the superlattice structure are alternately laminated.
5. The LED of claim 4 , wherein the well layers are interposed between the barrier layers with the superlattice structure.
6. A light emitting diode (LED) comprising an active region between a GaN-based N-type compound semiconductor layer and a GaN-based P-type compound semiconductor layer,
wherein the active region comprises a well layer and a barrier layer, the barrier layer having a superlattice structure,
wherein the well layer comprises InGaN, the barrier layer comprises the superlattice structure in which InGaN and GaN are alternately laminated, and InGaN in the well layer contains a larger amount of In than InGaN in the barrier layer, and
wherein the well layer comprises In x Ga (1-x) N, and the barrier layer comprises a lower superlattice having In y Ga (1-y) N and GaN alternately laminated, an upper superlattice having In y Ga (1-y) N and GaN alternately laminated, and a middle superlattice interposed between the lower superlattice and the upper superlattice, the middle superlattice having In z Ga (1-z) N and GaN alternately laminated, where 0<x<1, 0<y<0.1, 0<z<0.05 and z<y<x.
7. The LED of claim 6 , wherein each of the In y Ga (1-y) N, GaN, and In z Ga (1-z) N in the barrier layer has a thickness in a range from 2.5 to 20 Å.
8. The LED of claim 6 , wherein the lower superlattice has In y Ga (1-y) N and GaN alternately laminated 4 to 10 times, the middle superlattice has In z Ga (1-z) N and GaN alternately laminated 6 to 20 times, and the upper superlattice has In y Ga (1-y) N and GaN alternately laminated 4 to 10 times.