Resin composition for forming insulating layer of printed wiring board
Disclosed is a halogen-free resin composition for printed wiring board production, which is remarkably reduced in quality deterioration due to moisture absorption of a semi-cured resin film (layer). Also disclosed is a copper film with resin or the like. The resin composition is characterized by containing a component A (one or more resins selected from the group consisting of bisphenol-A epoxy resins, bisphenol-F epoxy resins and bisphenol-AD epoxy resins, which have an epoxy equivalent of not more than 200, while being in a liquid state at 25 DEG C.), a component B (a linear polymer having a crosslinkable functional group), a component C (a crosslinking agent), a component D (an imidazole-based epoxy resin curing agent) and a component E (a phosphorus-containing epoxy resin). The resin composition is also characterized by containing 0.5-3.0% by weight of phosphorus atoms per 100% by weight of the resin composition. In the copper foil with resin, a resin layer is formed by using the resin composition.
1. A resin composition for forming an insulating layer of a printed wiring board, the resin composition comprising components A to E:
(A) at least one epoxy resin, which is liquid at 25° C. and has an epoxy equivalent weight of 200 or less, and which is selected from the group consisting of bisphenol-A epoxy resin, bisphenol-F epoxy resin and bisphenol-AD epoxy resin, said component A provided in an amount of 3 to 20 wt % of the overall composition;
(B) a polyvinyl acetal resin, said component B provided in an amount of 3 to 30 wt % of the overall composition;
(C) a urethane resin, said component C provided in a positive amount of not more than 10 wt % of the overall composition;
(D) an imidazole curing agent; and
(E) a phosphorus-containing epoxy resin, said component E provided in an amount yielding a phosphorous atom content in the overall composition of 0.5 wt % to 3.0 wt %;
wherein the resin composition resists moisture absorption when semi-cured, and a copper clad laminate manufactured with the resin composition exhibits a solder blister time of 600 seconds or more when the copper clad laminate is floated on a solder bath at 260° C.; wherein the copper clad laminate is manufactured by: preparing a resin varnish with the resin composition; coating a copper foil with the resin varnish; drying the coated copper foil to form a semi-cured resin layer; exposing the dried coated copper foil to a temperature of 30° C. and a relative humidity of 65% for 15 hours; and laminating the exposed coated copper foil to an inner layer core wiring board by hot-pressing.
2. The resin composition for forming an insulating layer of a printed wiring board according to claim 1 , wherein component E comprises at least one epoxy resin obtained from 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and having two or more intermolecular epoxy groups.
3. The resin composition for forming an insulating layer of a printed wiring board according to claim 2 , wherein the at least one epoxy resin obtained from 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and having two or more intermolecular epoxy groups comprises one or more compounds represented by any one of Formulas 1 to 3:
where n represents a number of repeating units.
4. A resin coated copper foil for manufacturing a printed wiring board comprising a semi-cured resin layer on a surface of the copper foil, wherein the semi-cured resin layer is formed with the resin composition according to claim 1 and has a thickness of 5 μm to 100 μm.
5. The resin coated copper foil for manufacturing a printed wiring board according to claim 4 , wherein the surface of the copper foil further comprises a silane coupling treatment layer.
6. A method for manufacturing the resin coated copper foil for manufacturing a printed wiring board according to claim 4 , comprising:
preparing the resin composition;
dissolving the resin composition in an organic solvent to prepare a resin varnish containing a resin solid content of 25 wt % to 50 wt %;
applying the resin varnish on the surface of the copper foil; and
drying the resin varnish to form the semi-cured resin layer having a thickness of 5 μm to 100 μm.
7. The method for manufacturing the resin coated copper foil for manufacturing a printed wiring board according to claim 6 , wherein component E comprises at least one epoxy resin obtained from 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and having two or more intermolecular epoxy groups.
8. A printed wiring board comprising an insulating layer formed by curing the resin composition according to claim 1 .