IP Library Granted Patent US 8,529,701
Granted Patent B2
US 8,529,701 · App. 12/537,017 · Granted Sep 10, 2013

Substrate processing apparatus

Inventors: Shinya Morita (Toyama, JP); Takayuki Nakada (Toyama, JP); Tomoyuki Matsuda (Toyama, JP); Keisuke Sakashita (Toyama, JP)
Assignee: Hitachi Kokusai Electric Inc.
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Quick Facts
Patent No.
US 8,529,701
App. No.
12/537,017
Granted
Sep 10, 2013
Kind
B2
Abstract

A substrate processing apparatus includes a reaction tube, the reaction tub including an inner tube made of quartz and an outer tube made of quartz; a manifold made of quartz disposed under the outer tube, a top surface of the manifold being in air-tight contact with a bottom surface of the outer tube via a sealing member; a seal cap cover made of quartz disposed under the manifold, a top surface of the seal cap cover being in air-tight contact with a bottom surface of the manifold via a sealing member; a seal cap covered by the seal cap cover, a top surface of the seal cap being in air-tight contact with a bottom surface of the seal cap cover via a sealing member; and at least one protrusion disposed at the bottom surface of one of the outer tube, the manifold, the seal cap cover, and combinations thereof.

Claims (23)

1. A substrate processing apparatus comprising:

a reaction tube comprising an inner tube and an outer tube;

a manifold disposed under the outer tube, a top surface of the manifold being in air-tight contact with a bottom surface of the outer tube via a sealing member;

a seal cap cover disposed under the manifold, a top surface of the seal cap cover being in air-tight contact with a bottom surface of the manifold via a sealing member;

a seal cap covered by the seal cap cover, a top surface of the seal cap being in air-tight contact with a bottom surface of the seal cap cover via a sealing member; and

at least one protrusion disposed at one of the bottom surface of the outer tube, the bottom surface of the manifold, the bottom surface of the seal cap cover and combinations thereof, wherein the protrusion at the bottom surface of the outer tube is disposed outside the sealing member between the top surface of the manifold and the bottom surface of the outer tube, the protrusion at the bottom surface of the manifold is disposed outside the sealing member between the top surface of the seal cap cover and the bottom surface of the manifold, and the protrusion at the bottom surface of seal cap cover is disposed outside the sealing member between the top surface of the seal cap and the bottom surface of the seal cap cover.

2. The substrate processing apparatus of claim 1 , wherein the outer tube comprises an exhaust pipe having a flange, and a bottom surface of the protrusion at the bottom surface of the outer tube is lower than a lowermost part of the flange.

3. The substrate processing apparatus of claim 1 , wherein the at least one protrusion disposed at the bottom surface of the outer tube has a ring shape.

4. A substrate processing apparatus comprising:

a reaction tube comprising an inner tube and an outer tube;

a manifold disposed under the outer tube, a top surface of the manifold being in air-tight contact with a bottom surface of the outer tube via a sealing member; and

a protrusion disposed at a bottom surface of a flange part of the outer tube, the protrusion being disposed outside the sealing member between the top surface of the manifold and the bottom surface of the outer tube and protruding downward from the bottom surface of the flange part.

5. A reaction tube comprising:

an inner tube and an outer tube;

a manifold disposed under the outer tube, a top surface of the manifold being in air-tight contact with a bottom surface of the outer tube via a sealing member; and

a protrusion disposed at a bottom surface of a flange part of the outer tube, the protrusion being disposed outside the sealing member between the top surface of the manifold and the bottom surface of the outer tube and protruding downward from the bottom surface of the flange part.

6. The substrate processing apparatus of claim 4 ,

wherein the outer tube comprises an exhaust pipe having a flange, and

wherein a bottom surface of the protrusion at the bottom surface of the outer tube is lower than a lowermost part of the flange.

7. The reaction tube of claim 5 ,

wherein the outer tube comprises an exhaust pipe having a flange, and

wherein a bottom surface of the protrusion at the bottom surface of the outer tube is lower than a lowermost part of the flange.

8. The reaction tube of claim 5 , wherein the protrusion has a ring shape.

Assignments (2)
CHANGE OF NAME Recorded Nov 26, 2018
From: HITACHI KOKUSAI ELECTRIC INC.
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 047620/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 23, 2009
From: MORITA, SHINYA; NAKADA, TAKAYUKI; MATSUDA, TOMOYUKI; SAKASHITA, KEISUKE
To: HITACHI KOKUSAI ELECTRIC, INC.
Reel/Frame 023270/0344 →
Priority Claims (1)
JP 2008-219724 · Aug 28, 2008 · national
Continuity (1)
Related Publication 20100050945A1 · Mar 4, 2010