Asymmetrical transistor device and method of fabrication

1. A method of fabricating a semiconductor device comprising:

providing a semiconductor substrate having a buried insulator layer, wherein an upper portion of the substrate is above a top surface of the buried insulator layer and a lower portion is below a bottom surface of the buried insulator layer;

providing a gate having first and second opposing gate sidewalls, the gate includes a first sidewall spacer on the second gate sidewall; and

forming a recess in the substrate adjacent to the second gate sidewall with the first sidewall spacer, wherein the recess extends through to the lower portion of the substrate;

selectively forming a semiconductor material in the recess to fill the recess;

removing the first sidewall spacer from the second gate sidewall;

forming second sidewall spacers on the first and second gate sidewalls; and

forming a source adjacent to the first gate sidewall and a drain adjacent to the second gate sidewall, the source and drain are separated by a channel in the upper portion of the substrate below the gate, the source has a source depth at about the top surface of the buried insulator layer and the drain has a drain depth below the top surface of the buried insulator layer to provide different drain and source depths.

2. The method as claimed in claim 1 wherein forming the recess comprises:

anisotropically etching the substrate adjacent to the first sidewall spacer to remove the upper portion of the substrate to expose a portion of the buried insulator layer;

isotropically etching an upper portion of the exposed portion of the buried insulator, leaving a lower portion of the exposed portion of the buried insulator layer remaining,

wherein an upper portion which is removed extends below the first sidewall spacer to form a neck portion; and

anisotropically etching remaining lower portion of the exposed portion of buried insulator layer adjacent to the first sidewall spacer and lower portion of the substrate adjacent to the first sidewall spacer.

3. The method as claimed in claim 2 wherein selectively forming the semiconductor material in the recess fills the recess including the neck portion.

4. The method as claimed in claim 3 wherein the drain depth of the drain is in the lower portion of the substrate below the bottom surface of the buried insulator layer.

5. The method as claimed in claim 2 wherein the drain depth of the drain is in the lower portion of the substrate below the bottom surface of the buried insulator layer.

6. The method as claimed in claim 1 wherein forming the recess comprises anisotropically etching the substrate adjacent to the first sidewall spacer.

7. The method as claimed in claim 6 wherein the drain depth of the drain is in the lower portion of the substrate below the bottom surface of the buried insulator layer.

8. The method as claimed in claim 6 wherein the drain depth of the drain is between the top and bottom surfaces of the buried insulator layer.

9. The method as claimed in claim 1 wherein the drain depth of the drain is in the lower portion of the substrate below the bottom surface of the insulator layer.

10. The method as claimed in claim 2 comprises forming a stressor in a drain region of the drain.

11. The method as claimed in claim 10 wherein the stressor has a top stressor surface above a top surface of the substrate.

12. The method as claimed in claim 1 comprises forming extension regions adjacent to the source and drain separated by the channel, wherein the extension regions extend under the second sidewall spacers.

13. A method of fabricating a semiconductor device comprising:

providing a substrate having a buried insulator layer, wherein an upper portion of the substrate is above a top surface of the buried insulator layer and a lower portion is below a bottom surface of the buried insulator layer;

providing a source region, a drain region and a channel region in the substrate; and

forming a recess in the drain region, the recess extends through the buried insulator layer and into the lower portion of the substrate;

selectively filling the recess with a semiconductor material; and

forming a source in the source region and a drain in the drain region filled with the semiconductor material, the source and drain are separated by the channel, the source has a source depth at about the top surface of the buried insulator layer and the drain has a drain depth below the top surface of the buried insulator layer to provide different drain and source depths.

14. The method of claim 13 wherein a top substrate surface includes a gate with first and second gate side walls and a first gate sidewall spacer on a second gate sidewall, wherein the edge of the first gate sidewall spacer is aligned with an edge of the recess and the channel region is below the gate.

15. The method of claim 14 wherein forming the recess comprises:

anisotropically etching the substrate adjacent to the first sidewall spacer to remove the upper portion of the substrate to expose a portion of the buried insulator layer;

isotropically etching an upper portion of the exposed portion of the buried insulator, leaving a lower portion of the exposed portion of the buried insulator layer remaining,

wherein an upper portion which is removed extends below the first sidewall spacer to form a neck portion;

anisotropically etching remaining lower portion of the exposed portion of buried insulator layer adjacent to the first sidewall spacer and lower portion of the substrate adjacent to the first sidewall spacer.

16. The method of claim 15 wherein the drain depth of the drain is in the lower portion of the substrate below the bottom surface of the buried insulator layer.

17. The method of claim 14 wherein forming the recess comprises anisotropically etching the substrate adjacent to the first sidewall spacer.

18. The method of claim 17 wherein the drain depth of the drain is in the lower portion of the substrate below the bottom surface of the buried insulator layer.

19. The method of claim 13 wherein the drain depth of the drain is in the lower portion of the substrate below the bottom surface of the insulator layer.

20. The method of claim 13 comprises forming a stressor in the drain region of the drain.

21. The method of claim 20 wherein the stressor has a top stressor surface above a top surface of the substrate.

22. A method of forming a device comprising:

providing a substrate having upper and lower portions separated by a buried insulator layer, wherein the upper portion contacts a top surface of the buried insulator layer and the lower portion contacts a bottom surface of the buried insulator; and

providing a first substrate region and a second substrate region which are separated by a channel region in the upper portion, wherein the second substrate region includes a semiconductor material and extends from a top surface of the substrate through the buried insulator layer to a depth below the bottom surface of the buried insulator layer; and

forming a first doped region in first substrate region and a second doped region in the second substrate region, the first and second doped regions are separated by the channel region in the upper portion of the substrate, wherein a first depth of the first doped region is at about the top surface of the buried insulator layer and a second depth of the second doped region is below the top surface of the buried insulator layer to provide different first and second doped region depths.

23. The method of claim 22 wherein the first doped region is a source of a transistor and the second doped region is a drain of the transistor.

24. The method of claim 22 wherein the buried insulator is disposed below the first doped region and channel region and not in the second doped region.

25. The method of claim 22 wherein a gate is provided on the top surface of the substrate above the channel region.

26. The method of claim 22 wherein the second substrate region comprises a stressor.

27. The method of claim 26 wherein the stressor has a top stressor surface above the substrate.