ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS
Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).
1 . A method of forming a microelectronic structure, said method comprising the steps of:
providing a substrate having a surface;
applying a composition to said surface, said composition comprising a compound dissolved or dispersed in a solvent system, said compound being selected from the group consisting of polymers, oligomers, and mixtures thereof, said compound comprising a carboxylic acid group;
crosslinking the compound in said composition to form a layer of composition that is substantially insoluble in ethyl lactate and to yield crosslinked compounds comprising linkages having the formula
forming a photoresist layer on said composition; and
exposing said composition to light so as to decrosslink said crosslinked compound.