IP Library › Granted Patent US 8,094,295
Granted Patent B2
US 8,094,295 · App. 12/555,610 · Granted Jan 10, 2012

Inspection method and inspection apparatus

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Quick Facts
Patent No.
US 8,094,295
App. No.
12/555,610
Granted
Jan 10, 2012
Kind
B2
Abstract

The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

Claims (6)

1. An inspection apparatus comprising:

a stage mechanism which supports an inspection object;

an illumination unit which irradiates said inspection object with a laser;

detection optical unit; and

a spatial filter;

wherein said illumination unit has movable beam expander which limits the illumination range.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →