Optical inspection method and optical inspection apparatus
View Patent ↗An optical inspection apparatus irradiates a light beam onto the outer surface of an object to be inspected, in the form of an illumination spot having an illumination intensity which is higher in the outer peripheral part of the object to be inspected than in the inner peripheral part thereof while uniformly maintains a temperature rise caused by the irradiation of the light beam, over the outer surface of the object to be inspected, in order to prevent the effective entire signal value of a scattered light signal from lowering, without lowering the linear speed of a movable stage for the object to be inspected in the outer peripheral part of the object to be inspected, thereby it is possible to prevent lowering of the detectability for a foreign matter or a defect, for preventing lowering of inspection throughput.
1. An inspection apparatus comprising:
a stage which moves a substrate in circumferential and radial directions, the substrate having an inner peripheral part and an outer peripheral part;
a light irradiation unit which irradiates said substrate with a first light beam having an intensity so as to form an illumination area on the substrate;
a light detection unit which detects a second light from said substrate; and
an adjusting unit which changes the intensity of said first light beam from a first intensity to a second intensity which is higher than the first intensity during radial displacement of the illumination area on the substrate from the inner peripheral part to the outer peripheral part of said substrate,
wherein said adjusting unit restrains the intensity of said first light beam at an edge of said substrate.
2. The inspection apparatus according to claim 1 , wherein the illumination area is a spot.
3. An inspection method comprising steps of:
moving a substrate in circumferential and radial directions, the substrate having an inner peripheral part and an outer peripheral part;
irradiating said substrate with a first light beam having an intensity so as to form an illumination area on the substrate;
detecting a second light from said substrate; and
adjusting the intensity of said first light beam from a first intensity to a second intensity which is higher than the first intensity during radial displacement of the illumination area on the substrate from the inner peripheral part to the outer peripheral part of said substrate; and
restraining the intensity of said first light beam at an edge of said substrate during the adjusting step.
4. The method according to claim 3 , wherein the illumination area is a spot.