In-situ cleaning of an imprint lithography tool
Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.
1. A method of cleaning an imprint lithography template in an imprint lithography system, the method comprising:
irradiating a surface of the template with vacuum ultraviolet radiation from a vacuum ultraviolet radiation source while the template is arranged within the imprint lithography system
wherein the vacuum ultraviolet radiation source is positioned in a chamber, and further comprising establishing a substantially laminar flow of non-UV-absorbing gas in the chamber flowing from the vacuum ultraviolet radiation source toward the template surface during the irradiating of the template surface.
2. The method of claim 1 , wherein the vacuum ultraviolet radiation source comprises a dielectric barrier discharge source.
3. The method of claim 1 , wherein irradiating the surface of the template includes irradiating an active surface of the template.
4. The method of claim 1 , further comprising positioning the template proximate the vacuum ultraviolet radiation source prior to irradiating the template.
5. The method of claim 1 , further comprising positioning the vacuum ultraviolet radiation source proximate the template prior to irradiating the template.
6. The method of claim 1 , wherein the non-UV-absorbing gas is nitrogen or argon.
7. The method of claim 1 , wherein a pressure in the chamber is greater than or substantially equal to atmospheric pressure.
8. The method of claim 1 , further comprising loading or unloading a substrate in the imprint lithography system while irradiating the template.
9. The method of claim 1 , wherein the template is coupled to a template chuck.
10. The method of claim 1 , further comprising flowing gas over a surface of the template and exhausting the gas from the imprint lithography system to remove contaminants from the imprint lithography system.
11. The method of claim 6 wherein the non-UV absorbing gas is nitrogen.
12. The method of claim 6 wherein the non-UV absorbing gas is argon.