MEMS device package with vacuum cavity by two-step solder reflow method
View Patent ↗In a method of vacuum packaging a MEMS device, at least one MEMS device is attached on a substrate. A solder preform is printed on the substrate at the perimeter surrounding the substrate. A lid is attached to the solder preform wherein the lid provides a cavity enclosing the at least one MEMS device. A first reflowing step reflows the solder at a first temperature, partially sealing the lid/substrate interface and at the same time does the outgassing and baking procedure for the packaging. Flux is applied onto an outer ring of the solder preform and a second step reflows the solder at a second temperature, completely sealing the lid/substrate interface and providing a vacuum cavity enclosing the at least one MEMS device.
1. A method of vacuum packaging comprising:
providing a substrate with a printed solder preform surrounding a perimeter of said substrate, wherein said solder preform has no designed gaps or channels;
attaching at least one MEMS device on said substrate;
attaching a lid to said solder preform wherein said lid provides a cavity enclosing said at least one MEMS device;
first reflowing said solder at a first temperature wherein said first reflowing partially seals the lid/substrate interface and wherein said first reflowing causes outgassing from said cavity;
thereafter applying flux onto an outer ring of said solder preform outside said lid; and
thereafter second reflowing said solder at a second temperature wherein said second reflowing completely seals said lid/substrate interface and wherein said second reflowing provides a vacuum cavity enclosing said at least one MEMS device.
2. The method according to claim 1 further comprising wire bonding said at least one MEMS device to at least one integrated circuit device wherein said at least one integrated circuit device is also enclosed within said cavity.
3. The method according to claim 1 further comprising applying flux to said outer ring of said solder preform prior to said first reflowing step.
4. The method according to claim 1 wherein said first reflowing step and said second reflowing step have different profiles.
5. The method according to claim 1 wherein said solder preform has a horizontal width of between about 0.8 and 2 millimeters.
6. The method according to claim 1 wherein said vacuum is less than 1 Torr.
7. The method according to claim 1 wherein said solder preform is lead-free.
8. The method according to claim 1 wherein said first reflowing step has a peak temperature of close to a melting temperature of said solder.
9. The method according to claim 1 wherein said lid has no vents or holes.
10. The method according to claim 1 wherein said vacuum is between 0.01 Torr and 10 Torr.
11. A method of vacuum packaging a MEMS device comprising:
providing a substrate having a printed solder preform surrounding a perimeter of said substrate wherein said solder preform has no designed gaps or channels;
attaching at least one MEMS device on said substrate;
attaching a lid to said solder preform wherein said lid provides a cavity enclosing said at least one MEMS device;
applying first flux to an outer ring of said solder perform;
thereafter first reflowing said solder at a first temperature wherein said first reflowing partially seals the lid/substrate interface and wherein said first reflowing causes outgassing from said cavity;
thereafter applying flux onto said outer ring of said solder preform outside said lid;and
thereafter second reflowing said solder at a second temperature wherein said second reflowing completely seals said lid/substrate interface and wherein said second reflowing provides a vacuum cavity enclosing said at least one MEMS device.
12. The method according to claim 11 further comprising wire bonding said at least one MEMS device to at least one integrated circuit device wherein said at least one integrated circuit device is also enclosed within said cavity.
13. The method according to claim 11 wherein said first reflowing step and said second reflowing step have different profiles.
14. The method according to claim 11 wherein said solder preform has a horizontal width of between about 0.8 and 2 millimeters.
15. The method according to claim 11 wherein said vacuum is less than 1 Torr.
16. The method according to claim 11 wherein said first reflowing step has a peak temperature of close to a melting temperature of said solder.
17. The method according to claim 11 wherein said vacuum is between 0.01 Torr and 10 Torr.
18. A method of vacuum packaging comprising:
providing a substrate with a printed solder preform surrounding a perimeter of said substrate;
attaching at least one MEMS device on said substrate;
attaching a lid to said solder preform wherein said lid provides a cavity enclosing said at least one MEMS device;
applying first flux to an outer ring of said solder perform;
thereafter, first reflowing said solder at a first temperature wherein said first reflowing partially seals the lid/substrate interface and wherein said first reflowing causes outgassing from said cavity;
thereafter applying second flux onto said outer ring of said solder perform outside said lid and
thereafter second reflowing said solder at a second temperature wherein said second reflowing completely seals said lid/substrate interface and wherein said second reflowing provides a vacuum cavity enclosing said at least one MEMS device.