Semiconductor device
View Patent ↗A semiconductor device is proposed in which signal delay due to compensation capacitance elements in peripheral circuit element regions is eliminated. The semiconductor device includes: a first region including memory cells; a second region 10 including a functional circuit; cell capacitors formed in the first region; and compensation capacitance elements 36 to 38 formed in the second region 10 , wherein the compensation capacitance elements 36 to 38 each include a lower electrode 36 , a capacitance insulating film 37 , and an upper electrode 38 , the lower electrode 36 , capacitance insulating film 37 , and upper electrode 38 being the same as those of the cell capacitors, and wherein the compensation capacitance elements are formed over an upper layer of the second region 10 excluding upper layer portions of drain diffusion layers 44, 46 or gate electrodes 32 of transistors in the functional circuit.
1. A semiconductor device comprising:
a first region including memory cells;
a second region including a functional circuit;
a cell capacitor formed in the first region; and
a compensation capacitance element formed in the second region,
wherein the compensation capacitance element includes a lower electrode, a capacitance insulating film, and an upper electrode, the lower electrode, capacitance insulating film, and upper electrode being the same as those of the cell capacitor, and
wherein the compensation capacitance elements are formed over an upper layer of the second region excluding upper layer portions of drain diffusion layers or gate electrodes of transistors in the functional circuit.
2. The semiconductor device according to claim 1 , wherein the compensation capacitance elements are formed above at least one of a sub-contact region and a well contact region of the transistor forming the functional circuit, and a source diffusion layer of the transistor.
3. The semiconductor device according to claim 1 , wherein the compensation capacitance elements are formed in a third region not including the functional circuit and the second region.
4. The semiconductor device according to claim 1 , wherein one of electrodes of the compensation capacitance element is connected to a ground wiring and the other electrode is connected to a power supply wiring.
5. The semiconductor device according to claim 1 , wherein the capacitance insulating film of the compensation capacitance element is formed along side walls and a bottom face of a channel formed on a layer including the compensation capacitance element.
6. The semiconductor device according to claim 5 , wherein the cell capacitor includes a capacitor film that is formed along side walls and a bottom face of a channel formed on a layer including the cell capacitor.
7. The semiconductor device according to claim 1 , wherein the memory cells constitute a Dynamic Random Access Memory (DRAM).