Method for fabricating color filter substrate
A method for fabricating a color filter substrate is disclosed, to realize the simplified fabrication process by forming a film-type color filter layer, which includes preparing a mask having patterns for forming color filter layers and a black matrix layer; positioning the mask above a film; irradiating light to the film through the mask; developing the film to form the film-type color filter layers and the black matrix layer; and adhering the developed film onto a substrate.
1. A method for fabricating a color filter substrate comprising:
preparing a mask having, on a transparent substrate, cyan C, magenta M and yellow Y patterns corresponding to a pixel region, and a light-shielding layer between each of the cyan C, magenta M and yellow Y patterns;
positioning the mask above a film;
simultaneously irradiating C, M and Y color light onto the film through the C, M and Y patterns of the mask;
developing the film to form a black matrix layer and R, G and B color filter layers, wherein the R, G and B color filter layers are formed with complementary colors of C, M and Y, and the black matrix layer is formed by the light-shielding layer; and
providing a substrate and adhering the developed film onto the substrate by tape.
2. The method of claim 1 , wherein the film has negative characteristics.
3. The method of claim 1 , wherein the light includes UV rays or visible rays.
4. The method of claim 1 , further comprising:
forming a common electrode on the R, G and B color filter layers, after adhering the developed film onto the substrate.
5. A method for fabricating a color filter substrate comprising:
adhering a film onto a substrate by tape;
preparing a mask having, on transparent substrate, cyan C, magenta M and yellow Y patterns corresponding to a pixel region, and a light-shielding layer between each of the cyan C, magenta M and yellow Y patterns;
positioning the mask above the film adhered onto the substrate;
simultaneously irradiating C, M and Y color light onto the film through the C, M and Y patterns of the mask; and
developing the film to form a black matrix layer and R, G and B color filter layers, wherein the R, G and B color filter layers are formed with complementary colors of C, M and Y, and the black matrix layer is formed by the light-shielding layer.
6. The method of claim 5 , wherein the film has negative characteristics.
7. The method of claim 5 , wherein the light includes UV rays or visible rays.
8. The method of claim 5 , further comprising:
forming a common electrode on the R, G and B color filter layers, after forming the R, G and B color filter layers and the black matrix layer.